All Stories

  1. Fabrication of bio-inspired 3D nanoimprint mold using acceleration-voltage-modulation electron-beam lithography
  2. Toward full three-dimensional (3D) high volume fabrication
  3. Lifetime amelioration of release-agent-free antireflection-structured replica molds by partial-filling ultraviolet nanoimprint lithography
  4. Nanoscale metal pattern-transfer technique using silver ink
  5. Super resolution technique for sub-100 nm nanoimprint mold via mechanical deformation method
  6. Electron beam direct writing of nanodot patterns on roll mold surfaces by electron beam on–off chopping control
  7. Computer generated hologram-ROM fabrication and duplication by EBL and UV-NIL
  8. Defect analysis and lifetime evaluation of a release-coated nanoimprint mold
  9. Fabrication of double-sided self-supporting antireflection-structured film by ultraviolet nanoimprint lithography
  10. Fabrication of high-aspect-ratio pattern via high throughput roll-to-roll ultraviolet nanoimprint lithography
  11. Super-resolution technique for nanoimprint mold using elastic UV-curable resin
  12. Fabrication of self-supporting antireflection-structured film by UV–NIL
  13. Fabrication of antireflection structure with antifouling-effect surface by ultraviolet nanoimprint lithography
  14. Dwell time adjustment for focused ion beam machining
  15. Nanoimprint Technology
  16. What is a Nanoimprint?
  17. Applications and Leading‐Edge Technology
  18. Ultraviolet Nanoimprint Lithography
  19. The design of ROM-type holographic memory with iterative Fourier transform algorithm
  20. Three-dimensional hologram-read-only memory duplication by nanoimprint lithography
  21. Improving the lifespan of the cantilever during electron assisted AFM lithography
  22. Three-dimensional measurements of UV-imprint process by micro-digital holographic-PTV
  23. A technique for transferring metal nano patterns from a plastic replica mold by using a metal oxide release layer
  24. Fabrication of roll mold using electron-beam direct writing and metal lift-off process
  25. Lifetime evaluation of release agent for ultraviolet nanoimprint lithography
  26. Control of Swelling Height of Si Crystal by Irradiating Ar Beam
  27. Fabrication of Smooth and Ultra-Sharp Diamond Knives of Lower than 60 nm Tip Diameter by Low Energy Oxygen Ion Beam Machining
  28. High-density pattern transfer via roll-to-roll ultraviolet nanoimprint lithography using replica mold
  29. Fabrication of carbon nanofibers using only ion beam irradiation to glassy carbon
  30. Degradation of release layer on high aspect ratio mold by contact angle measurement
  31. Fabrication of the metal nano pattern on plastic substrate using roll nanoimprint
  32. Fabrication of Anti-reflection Structure using Photo-curable Polymer
  33. Transparent Roll Mold Fabrication Method and Transfer to Photo-curable Polymer
  34. Fabrication of a seamless roll mold using inorganic electron beam resist with postexposure bake
  35. Macro-optical inspection method for deterioration evaluation of release-coated mold surfaces for nanoimprint lithography
  36. Large-diameter roll mold fabrication method using a small-diameter quartz roll mold and UV nanoimprint lithography
  37. Three-dimensional nanoimprint lithography using photocurable resins
  38. Two-tone metal pattern transfer technique using a single mold surface
  39. Evaluation of filling behavior on UV nanoimprint lithography using release coating
  40. Technique for transfer of high-density, high-aspect-ratio nanoscale patterns in UV nanoimprint lithography and measurement of the release force
  41. Three Dimensional Nanoimprint Lithography Using Inorganic Electron Beam Resist
  42. Fabrication Technique of Nanoimprint Mold
  43. Three-dimensional Metal Nano Pattern Transfer on PET using Metal Oxide Layer
  44. Assessment of release properties in UV nanoimprint lithography using high-aspect-ratio nanoscale molds
  45. Electrical properties of transferred metal nanopattern using metal oxide release layer
  46. Three-Dimensional Measurements of Photo-curing Process With Photo-curable Resin for UV-Nanoimprint by Micro-digital-Holographic-PTV
  47. Fabrication of seamless three-dimensional roll mold using direct electron-beam writing on rotating cylindrical substrate
  48. Photo‐curable resins and evaluation methods for UV‐nanoimprint lithography
  49. Surface deformation of Ar+ ion collision process via molecular dynamics simulation with comparison to experiment
  50. Nanoprint lithography of gold nanopatterns on polyethylene terephthalate
  51. Filling behavior of UV nanoimprint resin observed by using a midair structure mold
  52. Observation of UV Nanoimprint Lithography Process by Micro-Digitalholographic-PTV
  53. Desktop Type Equipment of Thermal-assisted UV Roller Imprinting
  54. Release Properties and Durability of Release Layer on UV Nanoimprint Lithography
  55. Fabrication of Non Reflective Structure on Glassy Carbon Surface Using Oxygen Ion Beam Irradiation
  56. Filling Behavior Observation on UV Nanoimprint Lithography
  57. Effect of Post Exposure Bake in Inorganic Electron Beam Resist and Utilizing for Nanoimprint Mold
  58. Fabrication of nanodot array molds by using an inorganic electron-beam resist and a postexposure bake
  59. Fabrication of a seamless roll mold by direct writing with an electron beam on a rotating cylindrical substrate
  60. Three-dimensional measurements of photo curing with process with photo-curable resin for UV-nanoimprint by micro-digital-holographic-PTV
  61. Fabrication of the nanoimprint mold using inorganic electron beam resist with post exposure bake
  62. Analysis on microstructure of interface layer in DLC/Si structures produced by FIB–CVD
  63. Highly charged ion beam applied to lithography technique (invited)
  64. Ion beam lithography by using highly charged ion beam of Ar
  65. Water-Evaporation Characteristics of Nano-Structure Surface
  66. Quantum Molecular Dynamics Study on Energy Transfer to the Secondary Electron in Surface Collision Process of an Ion
  67. Sub-micrometer-scale patterning on Zr-based metallic glass using focused ion beam irradiation and chemical etching
  68. Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography
  69. Improving the sensitivity and line edge roughness in inorganic positive electron beam resist
  70. Internal structure transition of spin-on glass by electron beam irradiation
  71. Quantum Molecular Dynamics Study on Energy Transfer to the Secondary Electron in Surface Collision Process of an Ion
  72. Sub-100-nm three-dimensional nanoimprint lithography
  73. Depth control of a silicon structure fabricated by 100qkeV Ar ion beam lithography
  74. 光ナノインプリント用光硬化性樹脂とその特性評価法
  75. Rapid nanopatterning of a Zr-based metallic glass surface utilizing focused ion beam induced selective etching
  76. Fabrication of Three-Dimensional Hydrogen Silsesquioxane Resist Structure using Electron Beam Lithography
  77. Measurements of 3D flow in a micro-pipe via micro digital holographic particle tracking velocimetry
  78. Ion-beam processing of single crystal diamond using SOG mask
  79. Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography
  80. Ion-beam lithography by use of highly charged Ar-ion beam
  81. Thermal Desorption Development of Spin-On Glass for Electron Beam Nanolithography
  82. Optimization of Processing Condition for Deposition of DLC Using FIB-CVD Method
  83. Etching characteristics of a silicon surface induced by focused ion beam irradiation
  84. Three-Dimensional Nanofabrication Utilizing Selective Etching of Silicon Induced by Focused Ion Beam Irradiation
  85. ディジタルホログラフィを用いたマイクロ流れの高時間分解三次元計測に関する研究
  86. Three-Dimensional Flow Tracking in a Micro Channel with High Time Resolution Using Micro Digital-Holographic Particle-Tracking Velocimetry
  87. Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method
  88. Influence of Heat Treatment on Mechanical Properties of DLC Deposited by FIB-CVD
  89. Investigation of Application Availability of UV-NIL by Using Several Types of Photo-curable Resin
  90. Research on Field Electron Emission from Diamond
  91. Microstructure Analysis of Diamond-Like Carbon Produced by Focused Ion Beam Assisted Chemical Vapor Deposition
  92. FIB‐CVD法によるDLC成形プロセスとその特性評価
  93. 3D imprint technology using substrate voltage change
  94. Fabrication of Low Line Edge Roughness Mold for Photo-Nanoimprint
  95. XPS studies on damage evaluation of single-crystal diamond chips processed with ion beam etching and reactive ion beam assisted chemical etching
  96. 3D Micro-Fabrication using Combination Technique of Nano-Scale Processing and Chemical Etching (2nd Report, Possibility of 3D Micro-Fabrication using Focused Ion Beam Process)
  97. Elimination of Pattern Defects of Nanoimprint under Atmospheric Conditions
  98. Evaluation of Line Edge Roughness in Nanoimprint Lithography Using Photocurable Polymer
  99. Diamond nanoimprint lithography
  100. Uniformity in Patterns Imprinted Using Photo-Curable Liquid Polymer
  101. Improvement of Imprinted Pattern Uniformity Using Sapphire Mold
  102. Direct Etching of Spin-on-Glass Films Exposed Using Synchrotron Radiation
  103. Measurement of Adhesive Force Between Mold and Photocurable Resin in Imprint Technology
  104. Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
  105. Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography
  106. Field emission from electron-beam-irradiated bulk diamond
  107. Focused-ion-beam-assisted etching of diamond in XeF[sub 2]
  108. Electron Beam Assisted Chemical Etching of Single-Crystal Diamond Substrates with Hydrogen Gas
  109. Utilizing of hydrocarbon contamination for prevention of the surface charge-up at electron-beam assisted chemical etching of a diamond chip
  110. Electron Beam Assisted Chemical Etching of Single Crystal Diamond Substrates
  111. 酸素ガスを用いたダイヤモンドの電子ビーム援用化学加工(第1報)
  112. Electron Beam Assisted Etching of Single Crystal Diamond Chips