Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography

Yoshiaki Ishii, Jun Taniguchi
  • Microelectronic Engineering, May 2007, Elsevier
  • DOI: 10.1016/j.mee.2007.01.133

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http://dx.doi.org/10.1016/j.mee.2007.01.133

The following have contributed to this page: Dr Jun Taniguchi