Depth control of a silicon structure fabricated by 100qkeV Ar ion beam lithography

Noritaka Kawasegi, Noboru Morita, Shigeru Yamada, Noboru Takano, Tatsuo Oyama, Sadao Momota, Jun Taniguchi, Iwao Miyamoto
  • Applied Surface Science, January 2007, Elsevier
  • DOI: 10.1016/j.apsusc.2006.07.037

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The following have contributed to this page: Dr Jun Taniguchi