Ion-beam lithography by use of highly charged Ar-ion beam

Sadao Momota, Shingo Iwamitsu, Shougo Goto, Yoichi Nojiri, Jun Taniguchi, Iwao Miyamoto, Hirohisa Ohno, Noboru Morita, Noritaka Kawasegi
  • Review of Scientific Instruments, March 2006, American Institute of Physics
  • DOI: 10.1063/1.2165269

The authors haven't finished explaining this publication. If you are the author, sign in to claim or explain your work.

Read Publication

http://dx.doi.org/10.1063/1.2165269

The following have contributed to this page: Dr Jun Taniguchi

In partnership with: