Ion-beam lithography by use of highly charged Ar-ion beam

Sadao Momota, Shingo Iwamitsu, Shougo Goto, Yoichi Nojiri, Jun Taniguchi, Iwao Miyamoto, Hirohisa Ohno, Noboru Morita, Noritaka Kawasegi
  • Review of Scientific Instruments, March 2006, American Institute of Physics
  • DOI: 10.1063/1.2165269

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