Ion beam lithography by using highly charged ion beam of Ar

Shingo Iwamitsu, Mamoru Nagao, Shahjada A. Pahlovy, Kohei Nishimura, Masaki Kashihara, Sadao Momota, Yoichi Nojiri, Jun Taniguchi, Iwao Miyamoto, Takaaki Nakao, Noboru Morita, Noritaka Kawasegi
  • Colloids and Surfaces A Physicochemical and Engineering Aspects, February 2008, Elsevier
  • DOI: 10.1016/j.colsurfa.2007.04.121

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http://dx.doi.org/10.1016/j.colsurfa.2007.04.121

The following have contributed to this page: Dr Jun Taniguchi