Fabrication of Three-Dimensional Hydrogen Silsesquioxane Resist Structure using Electron Beam Lithography

Yasushi Matsubara, Jun Taniguchi, Iwao Miyamoto
  • Japanese Journal of Applied Physics, June 2006, Japan Society of Applied Physics
  • DOI: 10.1143/jjap.45.5538

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http://dx.doi.org/10.1143/jjap.45.5538

The following have contributed to this page: Dr Jun Taniguchi