Effect of Post Exposure Bake in Inorganic Electron Beam Resist and Utilizing for Nanoimprint Mold

Miyako Shizuno, Jun Taniguchi, Kenta Ogino, Kiyoshi Ishikawa
  • Journal of Nanoscience and Nanotechnology, January 2009, American Scientific Publishers
  • DOI: 10.1166/jnn.2009.j040

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http://dx.doi.org/10.1166/jnn.2009.j040

The following have contributed to this page: Dr Jun Taniguchi