Focused-ion-beam-assisted etching of diamond in XeF[sub 2]

Jun Taniguchi
  • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, July 1998, American Vacuum Society
  • DOI: 10.1116/1.590199

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http://dx.doi.org/10.1116/1.590199

The following have contributed to this page: Dr Jun Taniguchi