Fabrication of the nanoimprint mold using inorganic electron beam resist with post exposure bake

Noriyuki Unno, Jun Taniguchi, Miyako Shizuno, Kiyoshi Ishikawa
  • Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, November 2008, American Vacuum Society
  • DOI: 10.1116/1.3010735

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The following have contributed to this page: Dr Jun Taniguchi