Technique for transfer of high-density, high-aspect-ratio nanoscale patterns in UV nanoimprint lithography and measurement of the release force

Jun Taniguchi, Yasuhiro Kamiya, Takeshi Ohsaki, Nobuji Sakai
  • Microelectronic Engineering, May 2010, Elsevier
  • DOI: 10.1016/j.mee.2009.12.051

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The following have contributed to this page: Dr Jun Taniguchi