Highly charged ion beam applied to lithography technique (invited)

Sadao Momota, Yoichi Nojiri, Jun Taniguchi, Iwao Miyamoto, Noboru Morita, Noritaka Kawasegi
  • Review of Scientific Instruments, January 2008, American Institute of Physics
  • DOI: 10.1063/1.2834317

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http://dx.doi.org/10.1063/1.2834317

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