Assessment of release properties in UV nanoimprint lithography using high-aspect-ratio nanoscale molds

Junki Takahashi, Jun Taniguchi, Yasuhiro Kamiya
  • January 2010, American Vacuum Society
  • DOI: 10.1116/1.3503896

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http://dx.doi.org/10.1116/1.3503896

The following have contributed to this page: Dr Jun Taniguchi