Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography

Jun Taniguchi, Kentaro Koga, Yasuo Kogo, Iwao Miyamoto
  • Microelectronic Engineering, April 2006, Elsevier
  • DOI: 10.1016/j.mee.2006.01.101

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http://dx.doi.org/10.1016/j.mee.2006.01.101

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