Fabrication of Low Line Edge Roughness Mold for Photo-Nanoimprint

Yuichi Kurashima, Hiroshi Hiroshima, Masanori Komuro, Sang Hoon Kim, Naoto Yamazaki, Jun Taniguchi, Iwao Miyamoto, Hideo Namatsu, Shinji Matsui
  • Japanese Journal of Applied Physics, June 2004, Japan Society of Applied Physics
  • DOI: 10.1143/jjap.43.4045

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http://dx.doi.org/10.1143/jjap.43.4045

The following have contributed to this page: Dr Jun Taniguchi