Improving the sensitivity and line edge roughness in inorganic positive electron beam resist

Kenta Ogino, Jun Taniguchi, Shin-ichi Satake, Keisuke Yamamoto, Yoshiaki Ishii, Kiyoshi Ishikawa
  • Microelectronic Engineering, May 2007, Elsevier
  • DOI: 10.1016/j.mee.2007.01.144

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http://dx.doi.org/10.1016/j.mee.2007.01.144

The following have contributed to this page: Dr Jun Taniguchi