What is it about?
This paper proposed a new scheme based on accelerator generation of short wavelength, high-power light sources. It cleverly combines the advantages of high repetition rate synchrotron radiation light sources and high radiation power free electron lasers, and is expected to produce EUV light sources in the 10 kW range. Once successfully developed, this solution will completely revolutionize the existing lithography, making accelerator based lithography factories possible.
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Why is it important?
This scheme is expected to produce EUV light sources in the 10 kW range. Once successfully developed, this solution will completely revolutionize the existing lithography, making accelerator based lithography factories possible.
Perspectives
Writing this article was a great pleasure as it has co-authors with whom I have had long standing collaborations. This article also lead to advanced light source groups contacting me and ultimately to a greater involvement in advanced light source research.
KS Zhou
Read the Original
This page is a summary of: Sustainable early-stage lasing in a low-emittance electron storage ring, Applied Physics Letters, December 2023, American Institute of Physics,
DOI: 10.1063/5.0177748.
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