All Stories

  1. Fiber‐Shaped Electronic Devices
  2. PEDOT:PSS:sulfonium salt composite hole injection layers for efficient organic light emitting diodes
  3. High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results
  4. Reacquisition of a spindle cell shape does not lead to the restoration of a youthful state in senescent human skin fibroblasts
  5. Ion‐Activated Greatly Enhanced Conductivity of Thin Organic Semiconducting Films in Two‐Terminal Devices
  6. Inorganic and Hybrid Interfacial Materials for Organic and Perovskite Solar Cells
  7. Interfacial engineering for organic and perovskite solar cells using molecular materials
  8. Suppressing the Photocatalytic Activity of Zinc Oxide Electron-Transport Layer in Nonfullerene Organic Solar Cells with a Pyrene-Bodipy Interlayer
  9. A carbon-doped tantalum dioxyfluoride as a superior electron transport material for high performance organic optoelectronics
  10. Reversible chemocapacitor system based on PDMAEMA polymers for fast sensing of VOCs mixtures
  11. Molecular materials as interfacial layers and additives in perovskite solar cells
  12. Enhanced Organic and Perovskite Solar Cell Performance through Modification of the Electron-Selective Contact with a Bodipy–Porphyrin Dyad
  13. Organic solar cells of enhanced efficiency and stability using zinc oxide:zinc tungstate nanocomposite as electron extraction layer
  14. Bio-orthogonal fluorinated resist for biomolecules patterning applications
  15. Lithium Doping of ZnO for High Efficiency and Stability Fullerene and Non-fullerene Organic Solar Cells
  16. Multi-electron reduction of Wells–Dawson polyoxometalate films onto metallic, semiconducting and dielectric substrates
  17. Guided cell adhesion, orientation, morphology and differentiation on silicon substrates photolithographically micropatterned with a cell-repellent cross-linked poly(vinyl alcohol) film
  18. Functionalized Zinc Porphyrins with Various Peripheral Groups for Interfacial Electron Injection Barrier Control in Organic Light Emitting Diodes
  19. Engineering of Porphyrin Molecules for use as Effective Cathode Interfacial Modifiers in Organic Solar Cells of Enhanced Efficiency and Stability
  20. Ultra-sensitive EUV resists based on acid-catalyzed polymer backbone breaking
  21. Plasma induced degradation and surface electronic structure modification of Poly(3-hexylthiophene) films
  22. A silanol-functionalized polyoxometalate with excellent electron transfer mediating behavior to ZnO and TiO2 cathode interlayers for highly efficient and extremely stable polymer solar cells
  23. Insights into the passivation effect of atomic layer deposited hafnium oxide for efficiency and stability enhancement in organic solar cells
  24. Hydrogen and nitrogen codoping of anatase TiO2 for efficiency enhancement in organic solar cells
  25. Microwave exposure as a fast and cost-effective alternative of oxygen plasma treatment of indium-tin oxide electrode for application in organic solar cells
  26. The effect of TiO2 component on the properties of acrylic and urea-aldehyde resins under accelerated ageing conditions
  27. Improved Stability of Polymer Solar Cells in Ambient Air via Atomic Layer Deposition of Ultrathin Dielectric Layers
  28. Low Work Function Lacunary Polyoxometalates as Electron Transport Interlayers for Inverted Polymer Solar Cells of Improved Efficiency and Stability
  29. Avoiding ambient air and light induced degradation in high-efficiency polymer solar cells by the use of hydrogen-doped zinc oxide as electron extraction material
  30. Porphyrin-Sensitized Evolution of Hydrogen using Dawson and Keplerate Polyoxometalate Photocatalysts
  31. Direct Current Conductivity of Thin-Film Ionic Conductors from Analysis of Dielectric Spectroscopic Measurements in Time and Frequency Domains
  32. Exploring the potential of Multiphoton Laser Ablation Lithography (MP-LAL) as a reliable technique for sub-50nm patterning
  33. New resist materials based on polyacetal main chain scission
  34. Water-Soluble Lacunary Polyoxometalates with Excellent Electron Mobilities and Hole Blocking Capabilities for High Efficiency Fluorescent and Phosphorescent Organic Light Emitting Diodes
  35. Surface Modification of ZnO Layers via Hydrogen Plasma Treatment for Efficient Inverted Polymer Solar Cells
  36. Dehydration of molybdenum oxide hole extraction layers via microwave annealing for the improvement of efficiency and lifetime in organic solar cells
  37. Surface passivation effect by fluorine plasma treatment on ZnO for efficiency and lifetime improvement of inverted polymer solar cells
  38. Positive molecular resists
  39. Correction: Hydrogenated under-stoichiometric tungsten oxide anode interlayers for efficient and stable organic photovoltaics
  40. Immobilization of Lipid Substrates: Application on Phospholipase A2 Determination
  41. Solution processed multi-color organic light emitting diodes for application in telecommunications
  42. Influence of microwave exposure of tungsten oxide hole extraction layers on nanomorphology, optical and electrical properties of organic photovoltaics
  43. Near-IR organic light emitting diodes based on porphyrin compounds
  44. Old Metal Oxide Clusters in New Applications: Spontaneous Reduction of Keggin and Dawson Polyoxometalate Layers by a Metallic Electrode for Improving Efficiency in Organic Optoelectronics
  45. Lithographically tuned one dimensional polymeric photonic crystal arrays
  46. Annealing-free highly crystalline solution-processed molecular metal oxides for efficient single-junction and tandem polymer solar cells
  47. Organic photovoltaic performance improvement using atomic layer deposited ZnO electron-collecting layers
  48. Scalable fabrication of nanostructured p-Si/n-ZnO heterojunctions by femtosecond-laser processing
  49. Tungsten polyoxometalate molecules as active nodes for dynamic carrier exchange in hybrid molecular/semiconductor capacitors
  50. Protein-Resistant Cross-Linked Poly(vinyl alcohol) Micropatterns via Photolithography Using Removable Polyoxometalate Photocatalyst
  51. Enhancing spectral response of organic photodetectors through surface modification of metal oxide electrodes
  52. Sol–gel synthesized, low-temperature processed, reduced molybdenum peroxides for organic optoelectronics applications
  53. Atomic-Layer-Deposited Aluminum and Zirconium Oxides for Surface Passivation of TiO2in High-Efficiency Organic Photovoltaics
  54. Fast Recovery of the High Work Function of Tungsten and Molybdenum Oxides via Microwave Exposure for Efficient Organic Photovoltaics
  55. Theoretical study on the electronic structure of triphenyl sulfonium salts: Electronic excitation and electron transfer processes
  56. Solution-processed nanostructured zinc oxide cathode interfacial layers for efficient inverted organic photovoltaics
  57. Harnessing photochemical internalization with dual degradable nanoparticles for combinatorial photo–chemotherapy
  58. The role of metal/metal oxide/organic anode interfaces in efficiency and stability of bulk heterojunction organic photodetectors
  59. Large work function shift of organic semiconductors inducing enhanced interfacial electron transfer in organic optoelectronics enabled by porphyrin aggregated nanostructures
  60. 1-D polymeric photonic crystals as spectroscopic zero-power humidity sensors
  61. Porphyrin oriented self-assembled nanostructures for efficient exciton dissociation in high-performing organic photovoltaics
  62. Hydrogenated under-stoichiometric tungsten oxide anode interlayers for efficient and stable organic photovoltaics
  63. All-Organic Sulfonium Salts Acting as Efficient Solution Processed Electron Injection Layer for PLEDs
  64. Highly porous tungsten oxides for electrochromic applications
  65. Solution-Processed Hydrogen Molybdenum Bronzes as Highly Conductive Anode Interlayers in Efficient Organic Photovoltaics
  66. Influence of the anion on the optoelectronic characteristics of triphenylsulfonium salts modified polymer light emitting devices
  67. Vapor-deposited hydrogenated and oxygen-deficient molybdenum oxide thin films for application in organic optoelectronics
  68. Emergence of ambient temperature ferroelectricity in meso-tetrakis(1-methylpyridinium-4-yl)porphyrin chloride thin films
  69. Solution processable tungsten polyoxometalate as highly effective cathode interlayer for improved efficiency and stability polymer solar cells
  70. Radiation Sensors Based on the Generation of Mobile Protons in Organic Dielectrics
  71. Polymer photonic technologies for optical communications
  72. Nanosession: Low-Dimensional Transport and Ballistic Effects
  73. Poster: Electronic Structure, Lattice Dynamics, and Transport
  74. Atomic layer deposited zirconium oxide electron injection layer for efficient organic light emitting diodes
  75. The Influence of Hydrogenation and Oxygen Vacancies on Molybdenum Oxides Work Function and Gap States for Application in Organic Optoelectronics
  76. Conduction mechanisms in tungsten-polyoxometalate self-assembled molecular junctions
  77. Photo-patternable fluorinated polyhedral oligomeric silsequioxane-functionalized (POSS-F) polymeric materials with ultra low dielectric constants
  78. High performance organic light emitting diodes using substoichiometric tungsten oxide as efficient hole injection layer
  79. Reduced transition metal oxides as electron injection layers in hybrid-PLEDs
  80. Barrierless hole injection through sub-bandgap occupied states in organic light emitting diodes using substoichiometric MoOx anode interfacial layer
  81. Effect of triphenylsulfonium triflate addition in wide band-gap polymer light-emitting diodes: improved charge injection, transport and electroplex-induced emission tuning
  82. Photodegradable Polymers for Biotechnological Applications
  83. A transmission line model for the optical simulation of multilayer structures and its application for oblique illumination of an organic solar cell with anisotropic extinction coefficient
  84. Interface engineering for efficient organic optoelectronic devices using nanostructured transition metal oxides
  85. 1-D polymeric Photonic Crystal humido-chromic sensor
  86. Molecular junctions made of tungsten-polyoxometalate self-assembled monolayers: Towards polyoxometalate-based molecular electronics devices
  87. Tungsten oxides as interfacial layers for improved performance in hybrid optoelectronic devices
  88. Laser-Induced Cell Detachment and Patterning with Photodegradable Polymer Substrates
  89. Laser-Induced Cell Detachment and Patterning with Photodegradable Polymer Substrates
  90. Reduced molybdenum oxide as an efficient electron injection layer in polymer light-emitting diodes
  91. Reduction of Tungsten Oxide: A Path Towards Dual Functionality Utilization for Efficient Anode and Cathode Interfacial Layers in Organic Light-Emitting Diodes
  92. Fluorescence properties of organic dyes: quantum chemical studies on the green/blue neutral and protonated DMA-DPH emitters in polymer matrices
  93. Incorporating triphenyl sulfonium salts in polyfluorene PLEDs: an all-organic approach to improved charge injection
  94. Powerless and Reversible Color Humidity Sensor
  95. Selective immobilization of proteins guided by photo-patterned poly(vinyl alcohol) structures
  96. Optical Modeling of Hybrid Polymer Solar Cells Using a Transmission-Line Model and Comparison With Experimental Results
  97. Nanostructured Metal Oxides as Cathode Interfacial Layers for Hybrid-Polymer Electronic Devices
  98. Electrochemical biosensor microarray functionalized by means of biomolecule friendly photolithography
  99. Thermally-Induced Acid Generation from 18-Molybdodiphosphate and 18-Tungstodiphosphate within Poly(2-Hydroxyethyl Methacrylate) Films
  100. Theoretical Investigation on the Effect of Protonation on the Absorption and Emission Spectra of Two Amine-Group-Bearing, Red “Push−Pull” Emitters, 4-Dimethylamino-4′-nitrostilbene and 4-(dicyanomethylene)-2-methyl-6- p -(dimethylamino) styryl-4H-pyra...
  101. A water soluble inorganic molecular oxide as a novel efficient electron injection layer for hybrid light-emitting diodes (HyLEDs)
  102. Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications
  103. Hybrid organic–inorganic materials for molecular proton memory devices
  104. Photochemically-Induced Acid Generation from 18-Molybdodiphosphate and 18-Tungstodiphosphate within Poly(2-Hydroxyethyl Methacrylate) Films
  105. Surface modification of polyhedral oligomeric silsesquioxane block copolymer films by 157 nm laser light
  106. Photopatterned PLED arrays for biosensing applications
  107. Chemical binding of biomolecules to micropatterned epoxy modified surfaces for biosensing applications
  108. Highly transparent partially fluorinated methacrylate polymers for optical waveguides
  109. Memory Structures Based on the Self-organization of Cu Nanoparticles Deposited by Hot-Wire CVD on Polythiophene Layers
  110. Materials for lithography in the nanoscale
  111. Molecular Storage Elements for Proton Memory Devices
  112. Flexible organic light emitting diodes (OLEDs) based on a blue emitting polyfluorene
  113. Preface: phys. stat. sol. (c) 5/12
  114. Flexible WO3based electrochromic displays using proton conducting solid electrolytes
  115. A low temperature surface modification assisted method for bonding plastic substrates
  116. Energy transfer processes among emitters dispersed in a single polymer layer for colour tuning in OLEDs
  117. All-organic optocouplers based on polymer light-emitting diodes and photodetectors
  118. A combined experimental and simulation study on thickness dependence of the emission characteristics in multicolor single layer organic light-emitting diodes
  119. Stochastic simulation studies of molecular resists for the 32nm technology node
  120. High aspect ratio micro/nano machining with proton beam writing on aqueous developable – easily stripped negative chemically-amplified resists
  121. Vertical devices of self-assembled hybrid organic/inorganic monolayers based on tungsten polyoxometalates
  122. Polyoxometalate-Based Layered Structures for Charge Transport Control in Molecular Devices
  123. Aqueous base developable: easy stripping, high aspect ratio negative photoresist for optical and proton beam lithography
  124. Tuning the Emitting Color of Organic Light-Emitting Diodes Through Photochemically Induced Transformations: Towards Single-Layer, Patterned, Full-Color Displays and White-Lighting Applications
  125. Nano-scale spatial control over surface morphology of biocompatible fluoropolymers at 157 nm
  126. Polymer self-assembled nano-structures and surface relief gratings induced with laser at 157nm
  127. Stochastic simulation studies of molecular resists
  128. A biomolecule friendly photolithographic process for fabrication of protein microarrays on polymeric films coated on silicon chips
  129. Exposure of molecular glass resist by e-beam and EUVIL
  130. Photochemically-induced ligand exchange reactions of ethoxy-oxo-molybdenum(V) tetraphenylporphyrin in chlorinated solvents
  131. Partially Fluorinated, Polyhedral Oligomeric Silsesquioxane-Functionalized (Meth)Acrylate Resists for 193 nm Bilayer Lithography
  132. Electrical characterization of molecular monolayers containing tungsten polyoxometalates
  133. Polymeric electrolytes for WO3-based all solid-state electrochromic displays
  134. Layer-by-layer UV micromachining methodology of epoxy resist embedded microchannels
  135. Plasma oxidation of polyhedral oligomeric silsesquioxane polymers
  136. Photolithographic Process Based on High Contrast Acrylate Photoresist for Multi-Protein Patterning
  137. Patterning Scheme Based on Photoacid Induced Spectral Changes for Single Layer, Patterned Full Color Light Emitting Diodes
  138. Oxygen-Plasma Modification of Polyhedral Oligomeric Silsesquioxane (POSS) Containing Copolymers for Micro- and Nanofabrication
  139. Self assembled structures on fluoro-polymers induced with laser light at 157nm
  140. Characterization of various insulators for possible use as low-k dielectrics deposited at temperatures below 200°C
  141. 157-nm Laser ablation of polymeric layers for fabrication of biomolecule microarrays
  142. Fabrication of WO 3 -based electrochromic displays using solid or gel-like organic electrolytes
  143. Photochemically induced emission tuning of conductive polumers used in OLEDs
  144. Characterization of various low- k dielectrics for possible use in applications at temperatures below 160 °C
  145. Glass Transition Temperature Monitoring in Bilayer and Patterned Photoresist Films
  146. Polyhedral Oligomeric Silsesquioxane (POSS) Based Resists:  Material Design Challenges and Lithographic Evaluation at 157 nm
  147. Polyhedral oligomeric silsesquioxane (POSS) acrylate copolymers for microfabrication: properties and formulation of resist materials
  148. Tunneling and negative resistance effects for composite materials containing polyoxometalate molecules
  149. Tunneling and negative resistance effects for composite materials containing polyoxometalate molecules
  150. Evaluation of poly(hydroxyethyl methacrylate) imaging chemistries for micropatterning applications
  151. Surface segregation of photoresist copolymers containing polyhedral oligomeric silsesquioxanes studied by x-ray photoelectron spectroscopy
  152. The challenges of 157 nm nanolithography: surface morphology of silicon-based copolymers
  153. Tunneling transport in polyoxometalate based composite materials
  154. Glass transition temperature studies in thin photoresist films with an interferometric method
  155. Polyhedral oligomeric silsesquioxane (POSS) based resist materials for 157-nm lithography
  156. Transport properties of polyoxometalate containing polymeric materials
  157. Resist process issues related to the glass transition changes in chemically amplified resist films
  158. Photoresist etch resistance enhancement using novel polycarbocyclic derivatives as additives
  159. Nanostructured imaging of biological specimens in vivo with laser plasma X-ray contact microscopy
  160. Dilute aqueous base developable resists for environmentally friendly and biocompatible processes
  161. Strippable aqueous base developable negative photoresist for high aspect ratio micromachining
  162. He2 60–90 nm photon source for investigating photodissociation dynamics of potential X-UV resists
  163. Biocompatible photolithographic process for the patterning of biomolecules
  164. Multi-analyte capillary immunosensor for the determination of hormones in human serum samples
  165. UV exposure and temperature effects on curing mechanisms in thin linseed oil films: Spectroscopic and chromatographic studies
  166. Free-radical synthesis of narrow polydispersed 2-hydroxyethyl methacrylate-based tetrapolymers for dilute aqueous base developable negative photoresists
  167. Highly Efficient Bicolor (Green−Blue) Fluorescence Imaging in Polymeric Films
  168. Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography
  169. Partially hydrogenated poly(vinyl phenol) based photoresist for near UV, high aspect ratio micromachining
  170. Removing foxing stains from old paper at 157nm
  171. PHOTOLITHOGRAPHIC MATERIALS FOR NOVEL BIOCOMPATIBLE LIFT OFF PROCESSES
  172. F 2 LASER (157 nm) LITHOGRAPHY: MATERIALS AND PROCESSES
  173. Negative (meth)acrylate resist materials based on novel crosslinking chemistry
  174. Simulation of latent image formation for ion beam projection lithography
  175. Photoresist materials for 157-nm photolithography
  176. Electron beam lithography simulation for high resolution and high-density patterns
  177. Application of a Novel Aqueous Base Developable Resist in Micromachining.
  178. Photolithographic patterning of proteins with photoresists processable under biocompatible conditions
  179. Polyoxometallate Containing Polymeric Materials for Nanolithography and Molecular Devices
  180. Development mechanism study by dissolution monitoring of positive methacrylate photoresists
  181. Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithography
  182. Aqueous base developable epoxy resist for high sensitivity electron beam lithography
  183. Epoxidized novolac resist (EPR) for high-resolution negative- and positive-tone electron beam lithography
  184. Single Shot, Laser Plasma X-Ray Contact Microscopy of Chlamydomonas
  185. Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography
  186. Mass spectroscopic and degassing characteristics of polymeric materials for 157 nm photolithography
  187. Thin-Film Study on the Oxidation of Linseed Oil in the Presence of Selected Copper Pigments
  188. Laser plasma x-ray contact microscopy of living specimens
  189. Evaluation of advanced epoxy novolac resist, EPR, for sub 100nm synchrotron x-ray proximity lithography
  190. Silylation and Dry Development of Chemically Amplified Resists SAL601*, AZPN114*1, and Epoxidised Resist (EPR*1) for High Resolution Electron-Beam Lithography
  191. Post-Exposure Bake Kinetics in Epoxy Novolac-Based Chemically Amplified Resists
  192. Single-pulse high-resolution x-ray contact microscopy with an advanced epoxy novolac resist
  193. Laser plasma x-ray contact microscopy of living specimens using a chemically amplified epoxy resist
  194. Electron-beam lithography on multilayer substrates: experimental and theoretical study
  195. Fabrication of Si nanodevices by optical lithography and anisotropic etching
  196. Silylation of epoxy functionalised photoresists for optical, e-beam lithography and micromachining applications
  197. Calculation of energy deposition in thin resist films over multilayer substrates
  198. Optical characterisation of thin organic films by analysing transmission measurements with the Forouhi-Bloomer model
  199. Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresists
  200. Positive-Tone E-Beam Lithography With Surface Silylation Of Negative-Tone Commercial Photoresists Sal 601 And AZPN 114
  201. Theoretical discussion of diffusion effects in negative chemically amplified resists based on contrast curve simulation
  202. Synthesis of some onium salts and their comparison as cationic photoinitiators in an epoxy resist
  203. Gel formation theory approach for the modelling of negative chemically amplified e-beam resists
  204. Application of a reaction-diffusion model for negative chemically amplified resists to determine electron-beam proximity correction parameters
  205. Determination of acid diffusion and energy deposition parameters by point e-beam exposure in chemically amplified resists
  206. An advanced epoxy novolac resist for fast high-resolution electron-beam lithography
  207. Surfactant-modified epoxy resins as novel negative-acting deep UV photoresists
  208. Photocatalytic Processes by Polyoxometalates. Splitting of Water. The Role of Dioxygen
  209. Photocatalytic processes by polyoxometalates. Splitting of water. The role of dioxygen
  210. Micropatterned Films of Tungsten Nuclei for Subsequent Metallization Formed of a Phosphotungstic Acid-Based Negative Resist
  211. Deep Ultraviolet Photoresist Based on Tungsten Polyoxometalates and Poly(Vinyl Alcohol) for Bilayer Photolithography
  212. ChemInform Abstract: Vanadium-Sensitized Photochemistry of Heteropoly Compounds. Mixed Molybdo- and Tungstovanadates.
  213. Vanadium-sensitized photochemistry of heteropoly compounds. Mixed molybdo- and tungstovandates
  214. Photocatalytic Oxidation of Organic Compounds with Heteropoly Electrolytes. Aspects on Photochemical Utilization of Solar Energy
  215. Photocatalytic multielectron photoreduction of 18-tungstodiphosphate in the presence of organic compounds — production of hydrogen
  216. Some photochemical aspects of polynuclear complexes of molybdenum and tungsten
  217. Photoresist polymeric materials for 157 nm photolithography
  218. Monolithic silicon optoelectronic biochips
  219. Fast, Chemically Amplified Epoxy Novolac Photoresist Soft X-Ray Contact Microscopy of Living Biological Species
  220. Process optimization and diffusion length evaluation of a new aqueous base developable negative epoxy electron beam resist
  221. Mechanical integrity failure of bulk-micromachined Si wafers: Influence of structure geometry and wafer handling