What is it about?
Noble in situ infrared spectroscopy and electron-spin-resonance techniques were revealed surface reactions during plasma etching of organic films.
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Why is it important?
The electron-spin-resonance (ESR) observations have truly characterized in situ the changes to surfaces in terms of dangling bonds.
Perspectives
Nevertheless of complicated reactions in plasma processes, both the ESR and IR-ATR techniques are successfully analyzed surface changes that lead to the formation of C-DBs and chemical bonds, such as CN and NH. On the basis of our experimental results in plasma of a mixture of nitrogen and hydrogen, we found that the nitrided surface plays a bilateral role for acting as both a precursor and an inhibitor on creation of products desorbed.
Dr Kenji Ishikawa
Nagoya University
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This page is a summary of: Surface reactions during etching of organic low-k films by plasmas of N2 and H2, Journal of Applied Physics, April 2006, American Institute of Physics,
DOI: 10.1063/1.2191567.
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