All Stories

  1. Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride

    Article • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, March 2022, American Vacuum Society

    Dr Kenji Ishikawa

  2. Low‐temperature reduction of SnO 2 by floating wire‐assisted medium‐pressure H 2 /Ar plasma

    Article • Plasma Processes and Polymers, February 2022, Wiley

    Dr Kenji Ishikawa

  3. Scaffolds with isolated carbon nanowalls promote osteogenic differentiation through Runt-related transcription factor 2 and osteocalcin gene expression of osteoblast-like cells

    Article • AIP Advances, February 2022, American Institute of Physics

    Dr Kenji Ishikawa

  4. Enhancement of ethanol production and cell growth in budding yeast by direct irradiation of low-temperature plasma

    Article • Japanese Journal of Applied Physics, December 2021, Institute of Physics Publishing

    Dr Kenji Ishikawa

  5. Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems

    Article • Japanese Journal of Applied Physics, December 2021, Institute of Physics Publishing

    Dr Kenji Ishikawa

  6. plasma-based in situ functionality of nitrogen

    Article • Japanese Journal of Applied Physics, December 2021, Institute of Physics Publishing

    Dr Kenji Ishikawa

  7. Towards prevention and prediction of infectious diseases with virus sterilization using ultraviolet light and low-temperature plasma and bio-sensing devices for health and hygiene care

    Article • Japanese Journal of Applied Physics, December 2021, Institute of Physics Publishing

    Dr Kenji Ishikawa

  8. On the Etching Mechanism of Highly Hydrogenated SiN Films by CF4/D2 Plasma: Comparison with CF4/H2

    Article • Coatings, December 2021, MDPI AG

    Dr Kenji Ishikawa

  9. Cancer Treatments Using Low-Temperature Plasma

    Article • Current Medicinal Chemistry, December 2021, Bentham Science Publishers

    Dr Kenji Ishikawa

  10. Low temperature plasma irradiation products of sodium lactate solution that induce cell death on U251SP glioblastoma cells were identified

    Article • Scientific Reports, September 2021, Springer Science + Business Media

    Dr Kenji Ishikawa

  11. Novel Method of Rebound Tailing Pulse (RTP) for Water Dissociation

    Article • IEEE Transactions on Plasma Science, September 2021, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Kenji Ishikawa

  12. Plasma‐activated Ringer's lactate solution inhibits the cellular respiratory system in HeLa cells

    Article • Plasma Processes and Polymers, July 2021, Wiley

    Dr Kenji Ishikawa

  13. Lysosomal nitric oxide determines transition from autophagy to ferroptosis after exposure to plasma-activated Ringer's lactate

    Article • Redox Biology, July 2021, Elsevier

    Dr Kenji Ishikawa

  14. Brain cell proliferation in adult rats after irradiation with nonequilibrium atmospheric pressure plasma

    Article • Applied Physics Express, June 2021, Institute of Physics Publishing

    Dr Kenji Ishikawa

  15. Hydrogen peroxide in lactate solutions irradiated by non-equilibrium atmospheric pressure plasma

    Article • Plasma Sources Science and Technology, April 2021, Institute of Physics Publishing

    Dr Kenji Ishikawa

  16. Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O2, and Ar

    Article • Applied Surface Science, March 2021, Elsevier

    Dr Kenji Ishikawa

  17. Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H2 plasma

    Article • Applied Surface Science, March 2021, Elsevier

    Dr Kenji Ishikawa

  18. Impact of seed color and storage time on the radish seed germination and sprout growth in plasma agriculture

    Article • Scientific Reports, January 2021, Springer Science + Business Media

    Dr Kenji Ishikawa

  19. Effects of Carbon Nanowalls (CNWs) Substrates on Soft Ionization of Low-Molecular-Weight Organic Compounds in Surface-Assisted Laser Desorption/Ionization Mass Spectrometry (SALDI-MS)

    Article • Nanomaterials, January 2021, MDPI AG

    Dr Kenji Ishikawa

  20. Growth inhibition effect on Trypanosoma brucei gambiense by the oxidative stress supplied from low-temperature plasma at atmospheric pressure

    Article • Japanese Journal of Applied Physics, January 2021, Institute of Physics Publishing

    Dr Kenji Ishikawa

  21. Mechanistic understanding of cold atmospheric plasma applications

    Article • Japanese Journal of Applied Physics, January 2021, Institute of Physics Publishing

    Dr Kenji Ishikawa

  22. Inside Front Cover: Plasma Process. Polym. 1/2021

    Article • Plasma Processes and Polymers, January 2021, Wiley

    Dr Kenji Ishikawa

  23. Reduction in photon-induced interface defects by optimal pulse repetition rate in the pulse-modulated inductively coupled plasma

    Article • Japanese Journal of Applied Physics, December 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  24. Inactivation mechanism of fungal spores through oxygen radicals in atmospheric-pressure plasma

    Article • Japanese Journal of Applied Physics, December 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  25. Insights into normothermic treatment with direct irradiation of atmospheric pressure plasma for biological applications

    Article • Japanese Journal of Applied Physics, December 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  26. Reaction science of layer-by-layer thinning of graphene with oxygen neutrals at room temperature

    Article • Carbon, December 2020, Elsevier

    Dr Kenji Ishikawa

  27. Influence of chamber pressure on the crystal quality of homo-epitaxial GaN grown by radical-enhanced MOCVD (REMOCVD)

    Article • Journal of Crystal Growth, November 2020, Elsevier

    Dr Kenji Ishikawa

  28. Improvement of yield and grain quality by periodic cold plasma treatment with rice plants in a paddy field

    Article • Plasma Processes and Polymers, October 2020, Wiley

    Dr Kenji Ishikawa

  29. Formation of spherical Sn particles by reducing SnO2 film in floating wire-assisted H2/Ar plasma at atmospheric pressure

    Article • Scientific Reports, October 2020, Springer Science + Business Media

    Dr Kenji Ishikawa

  30. Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources

    Article • ACS Omega, October 2020, American Chemical Society (ACS)

    Dr Kenji Ishikawa

  31. Inside Back Cover Picture: Plasma Process. Polym. 10/2020

    Article • Plasma Processes and Polymers, October 2020, Wiley

    Dr Kenji Ishikawa

  32. Laser-induced-plasma-activated medium enables killing of HeLa cells

    Article • Applied Physics Express, September 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  33. Small size gold nanoparticles enhance apoptosis-induced by cold atmospheric plasma via depletion of intracellular GSH and modification of oxidative stress

    Article • Cell Death Discovery, September 2020, Springer Science + Business Media

    Dr Kenji Ishikawa

  34. Plasma Agriculture from Laboratory to Farm: A Review

    Article • Processes, August 2020, MDPI AG

    Dr Kenji Ishikawa

  35. Steering of surface discharges on through-glass-vias combined with high-density nonequilibrium atmospheric pressure plasma generation

    Article • Journal of Physics D Applied Physics, August 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  36. Numerical analysis of coaxial dielectric barrier helium discharges: three-stage mode transitions and internal bullet propagation

    Article • Applied Physics Express, July 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  37. Adjusted multiple gases in the plasma flow induce differential antitumor potentials of plasma‐activated solutions

    Article • Plasma Processes and Polymers, July 2020, Wiley

    Dr Kenji Ishikawa

  38. In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, July 2020, American Vacuum Society

    Dr Kenji Ishikawa

  39. Non-thermal plasma–activated lactate solution kills U251SP glioblastoma cells in an innate reductive manner with altered metabolism

    Article • Archives of Biochemistry and Biophysics, July 2020, Elsevier

    Dr Kenji Ishikawa

  40. Electron spin resonance as a tool to monitor the influence of novel processing technologies on food properties

    Article • Trends in Food Science & Technology, June 2020, Elsevier

    Dr Kenji Ishikawa

  41. In-plane modification of hexagonal boron nitride particles via plasma in solution

    Article • Applied Physics Express, May 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  42. Electronic properties and primary dissociation channels of fluoromethane compounds

    Article • Japanese Journal of Applied Physics, May 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  43. Dry Process

    Article • Japanese Journal of Applied Physics, May 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  44. Synthesis of isolated carbon nanowalls via high-voltage nanosecond pulses in conjunction with CH4/H2 plasma enhanced chemical vapor deposition

    Article • Carbon, May 2020, Elsevier

    Dr Kenji Ishikawa

  45. Numerical simulations of stable, high-electron-density atmospheric pressure argon plasma under pin-to-plane electrode geometry: effects of applied voltage polarity

    Article • Journal of Physics D Applied Physics, April 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  46. Characterization of a microsecond pulsed non-equilibrium atmospheric pressure Ar plasma using laser scattering and optical emission spectroscopy

    Article • Plasma Science and Technology, April 2020, Institute of Physics Publishing

    Dr Kenji Ishikawa

  47. In‐Liquid Plasma Synthesis of Nanographene with a Mixture of Methanol and 1‐Butanol

    Article • ChemNanoMat, April 2020, Wiley

    Dr Kenji Ishikawa

  48. In‐Liquid Plasma Synthesis of Nanographene with a Mixture of Methanol and 1‐Butanol

    Article • ChemNanoMat, April 2020, Wiley

    Dr Kenji Ishikawa

  49. Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp2 carbon structures

    Article • Diamond and Related Materials, April 2020, Elsevier

    Dr Kenji Ishikawa

  50. Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study

    Article • Journal of Applied Physics, January 2020, American Institute of Physics

    Dr Kenji Ishikawa

  51. Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate

    Article • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, November 2019, American Vacuum Society

    Dr Kenji Ishikawa

  52. Oxidative stress-dependent and -independent death of glioblastoma cells induced by non-thermal plasma-exposed solutions

    Article • Scientific Reports, September 2019, Springer Science + Business Media

    Dr Kenji Ishikawa

  53. Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, September 2019, American Vacuum Society

    Dr Kenji Ishikawa

  54. Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O2 downstream plasma

    Article • Journal of Physics D Applied Physics, August 2019, Institute of Physics Publishing

    Dr Kenji Ishikawa

  55. Atmospheric Pressure Plasma-Treated Carbon Nanowalls’ Surface-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (CNW-SALDI-MS)

    Article • C – Journal of Carbon Research, July 2019, MDPI AG

    Dr Kenji Ishikawa

  56. Review of methods for the mitigation of plasma-induced damage to low-dielectric-constant interlayer dielectrics used for semiconductor logic device interconnects

    Article • Plasma Processes and Polymers, June 2019, Wiley

    Dr Kenji Ishikawa

  57. Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes?

    Article • Japanese Journal of Applied Physics, May 2019, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  58. Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development

    Article • Japanese Journal of Applied Physics, May 2019, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  59. Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation

    Article • Japanese Journal of Applied Physics, May 2019, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  60. Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective

    Article • Japanese Journal of Applied Physics, May 2019, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  61. Cover Picture: Plasma Process. Polym. 6/2019

    Article • Plasma Processes and Polymers, May 2019, Wiley

    Dr Kenji Ishikawa

  62. Simultaneous achievement of antimicrobial property and plant growth promotion using plasma‐activated benzoic compound solution

    Article • Plasma Processes and Polymers, May 2019, Wiley

    Dr Kenji Ishikawa

  63. Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation

    Article • ACS Applied Bio Materials, May 2019, American Chemical Society (ACS)

    Dr Kenji Ishikawa

  64. Chemical bonding structure in porous SiOC films (k < 2.4) with high plasma-induced damage resistance

    Article • Micro and Nano Engineering, May 2019, Elsevier

    Dr Kenji Ishikawa

  65. Erratum to “Chemical bonding structure in porous SiOC films (k < 2.4) with high plasma-induced damage resistance” [Micro and Nano Engineering Vol. 3 (2019) 1–6]

    Article • Micro and Nano Engineering, May 2019, Elsevier

    Dr Kenji Ishikawa

  66. Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition

    Article • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, May 2019, American Vacuum Society

    Dr Kenji Ishikawa

  67. Electronic properties and primarily dissociation channels of fluoroethane compounds

    Article • Japanese Journal of Applied Physics, May 2019, Institute of Physics Publishing

    Dr Kenji Ishikawa

  68. Laser-drilling formation of through-glass-via (TGV) on polymer-laminated glass

    Article • Journal of Materials Science Materials in Electronics, April 2019, Springer Science + Business Media

    Dr Kenji Ishikawa

  69. Facile synthesis of SnO2-graphene composites employing nonthermal plasma and SnO2 nanoparticles-dispersed ethanol

    Article • Journal of Physics D Applied Physics, February 2019, Institute of Physics Publishing

    Dr Kenji Ishikawa

  70. Systematic diagnostics of the electrical, optical, and physicochemical characteristics of low-temperature atmospheric-pressure helium plasma sources

    Article • Journal of Physics D Applied Physics, February 2019, Institute of Physics Publishing

    Dr Kenji Ishikawa

  71. Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF6-added plasma etching of quartz glass

    Article • Journal of Applied Physics, February 2019, American Institute of Physics

    Dr Kenji Ishikawa

  72. Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition

    Article • Japanese Journal of Applied Physics, February 2019, Institute of Physics Publishing

    Dr Kenji Ishikawa

  73. Non-thermal plasma-activated medium modified metabolomic profiles in the glycolysis of U251SP glioblastoma

    Article • Archives of Biochemistry and Biophysics, February 2019, Elsevier

    Dr Kenji Ishikawa

  74. Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries

    Article • ACS Applied Nano Materials, February 2019, American Chemical Society (ACS)

    Dr Kenji Ishikawa

  75. Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition

    Article • C – Journal of Carbon Research, January 2019, MDPI AG

    Dr Kenji Ishikawa

  76. Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition

    Article • C – Journal of Carbon Research, January 2019, MDPI AG

    Dr Kenji Ishikawa

  77. Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system

    Article • Japanese Journal of Applied Physics, January 2019, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  78. Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt-nanoparticle-supported carbon nanowalls

    Article • Journal of Physics D Applied Physics, January 2019, Institute of Physics Publishing

    Dr Kenji Ishikawa

  79. Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas

    Article • Plasma Processes and Polymers, January 2019, Wiley

    Dr Kenji Ishikawa

  80. Molecular mechanisms of non-thermal plasma-induced effects in cancer cells

    Article • Biological Chemistry, December 2018, De Gruyter

    Dr Kenji Ishikawa

  81. Liquid dynamics in response to an impinging low-temperature plasma jet

    Article • Journal of Physics D Applied Physics, December 2018, Institute of Physics Publishing

    Dr Kenji Ishikawa, Dr Sven G Bilén

  82. Real-time control of a wafer temperature for uniform plasma process

    Article • December 2018, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Kenji Ishikawa

  83. Effect of N2/H2 plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD)

    Article • AIP Advances, November 2018, American Institute of Physics

    Dr Kenji Ishikawa

  84. Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching

    Article • Japanese Journal of Applied Physics, August 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  85. New Hopes for Plasma-Based Cancer Treatment

    Article • Plasma, August 2018, MDPI AG

    Dr Kenji Ishikawa

  86. Cytotoxic effects of plasma-irradiated fullerenol

    Article • Journal of Physics D Applied Physics, July 2018, Institute of Physics Publishing

    Dr Kenji Ishikawa

  87. Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH 4 /H 2 at 300–500 °C

    Article • Vacuum, July 2018, Elsevier

    Dr Kenji Ishikawa

  88. Reviewing of critical dimension uniformity at the atomically scaled feature's bottom.

    Article • Japanese Journal of Applied Physics, May 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  89. Effects of gas residence time of CH4/H2 on sp2 fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition

    Article • Japanese Journal of Applied Physics, May 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  90. Low-autofluorescence fluoropolymer membrane filters for cell filtration

    Article • Japanese Journal of Applied Physics, May 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  91. Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma

    Article • Japanese Journal of Applied Physics, May 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  92. Dissociative properties of 1,1,1,2-tetrafluoroethane obtained by computational chemistry

    Article • Japanese Journal of Applied Physics, April 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  93. Impact of helium pressure in arc plasma synthesis on crystallinity of single-walled carbon nanotubes

    Article • Japanese Journal of Applied Physics, April 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  94. Isotropic atomic level etching of tungsten using formation and desorption of tungsten fluoride

    Article • March 2018, SPIE

    Dr Kenji Ishikawa

  95. Nanographene synthesized in triple-phase plasmas as a highly durable support of catalysts for polymer electrolyte fuel cells

    Article • Japanese Journal of Applied Physics, March 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  96. Cytotoxicity of cancer HeLa cells sensitivity to normal MCF10A cells in cultivations with cell culture medium treated by microwave-excited atmospheric pressure plasmas

    Article • Journal of Physics D Applied Physics, February 2018, Institute of Physics Publishing

    Dr Kenji Ishikawa

  97. Oxygen reduction reaction properties of nitrogen-incorporated nanographenes synthesized using in-liquid plasma from mixture of ethanol and iron phthalocyanine

    Article • Japanese Journal of Applied Physics, February 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  98. Free radical generation by non-equilibrium atmospheric pressure plasma in alcohol–water mixtures: an EPR-spin trapping study

    Article • Journal of Physics D Applied Physics, February 2018, Institute of Physics Publishing

    Dr Kenji Ishikawa

  99. Facile fabrication of a poly(ethylene terephthalate) membrane filter with precise arrangement of through-holes

    Article • Japanese Journal of Applied Physics, January 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  100. Reduced HeLa cell viability in methionine-containing cell culture medium irradiated with microwave-excited atmospheric-pressure plasma

    Article • Plasma Processes and Polymers, January 2018, Wiley

    Dr Kenji Ishikawa

  101. Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons

    Article • Japanese Journal of Applied Physics, January 2018, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  102. Electron impact ionization of perfluoro-methyl-vinyl-ether C3F6O

    Article • Plasma Sources Science and Technology, January 2018, Institute of Physics Publishing

    Dr Kenji Ishikawa

  103. Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol

    Article • Applied Physics Express, December 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  104. Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials

    Article • Japanese Journal of Applied Physics, December 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  105. Plasma-activated medium (PAM) kills human cancer-initiating cells

    Article • Pathology International, December 2017, Wiley

    Dr Kenji Ishikawa

  106. Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy

    Article • Journal of Applied Physics, December 2017, American Institute of Physics

    Dr Kenji Ishikawa, Dr Sven G Bilén

  107. Dependence of absolute photon flux on infrared absorbance alteration and surface roughness on photoresist polymers irradiated with vacuum ultraviolet photons emitted from HBr plasma

    Article • Japanese Journal of Applied Physics, November 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  108. Surface roughening of photoresist after change of the photon/radical and ion treatment sequence

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, November 2017, American Vacuum Society

    Dr Kenji Ishikawa

  109. Selective production of reactive oxygen and nitrogen species in the plasma-treated water by using a nonthermal high-frequency plasma jet

    Article • Japanese Journal of Applied Physics, October 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  110. Crystallization of calcium oxalate dihydrate in a buffered calcium-containing glucose solution by irradiation with non-equilibrium atmospheric pressure plasma

    Article • Journal of Applied Physics, October 2017, American Institute of Physics

    Dr Kenji Ishikawa

  111. Intracellular responses to reactive oxygen and nitrogen species, and lipid peroxidation in apoptotic cells cultivated in plasma-activated medium

    Article • Plasma Processes and Polymers, September 2017, Wiley

    Dr Kenji Ishikawa

  112. Cold atmospheric helium plasma causes synergistic enhancement in cell death with hyperthermia and an additive enhancement with radiation

    Article • Scientific Reports, September 2017, Nature

    Dr Kenji Ishikawa

  113. High-durability catalytic electrode composed of Pt nanoparticle-supported carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition

    Article • Journal of Physics D Applied Physics, September 2017, Institute of Physics Publishing

    Dr Kenji Ishikawa

  114. Thermally enhanced formation of photon-induced damage on GaN films in Cl2 plasma

    Article • Japanese Journal of Applied Physics, August 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  115. (Invited) Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication

    Article • ECS Transactions, August 2017, The Electrochemical Society

    Dr Kenji Ishikawa

  116. Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy

    Article • Biointerphases, August 2017, American Vacuum Society

    Dr Kenji Ishikawa

  117. Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation

    Article • Applied Physics Express, July 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  118. State of the art in medical applications using non-thermal atmospheric pressure plasma

    Article • Reviews of Modern Plasma Physics, July 2017, Springer Science + Business Media

    Dr Kenji Ishikawa

  119. Temperature dependence of protection layer formation on organic trench sidewall in H2/N2 plasma etching with control of substrate temperature

    Article • Japanese Journal of Applied Physics, June 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  120. Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition

    Article • Japanese Journal of Applied Physics, June 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  121. Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions?

    Article • Japanese Journal of Applied Physics, June 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  122. Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas

    Article • Japanese Journal of Applied Physics, May 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  123. Dry Process

    Article • Japanese Journal of Applied Physics, May 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  124. Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 °C

    Article • Japanese Journal of Applied Physics, May 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  125. Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing

    Article • Journal of Physics D Applied Physics, April 2017, Institute of Physics Publishing

    Dr Kenji Ishikawa

  126. Spatial distributions of O, N, NO, OH and vacuum ultraviolet light along gas flow direction in an AC-excited atmospheric pressure Ar plasma jet generated in open air

    Article • Journal of Physics D Applied Physics, April 2017, Institute of Physics Publishing

    Dr Kenji Ishikawa

  127. Bactericidal pathway ofEscherichia coliin buffered saline treated with oxygen radicals

    Article • Journal of Physics D Applied Physics, March 2017, Institute of Physics Publishing

    Dr Kenji Ishikawa

  128. Effects of •OH and •NO radicals in the aqueous phase on H2O2and $\text{NO}_{2}^{-}$ generated in plasma-activated medium

    Article • Journal of Physics D Applied Physics, March 2017, Institute of Physics Publishing

    Dr Kenji Ishikawa

  129. Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas

    Article • Journal of Physics D Applied Physics, March 2017, Institute of Physics Publishing

    Dr Kenji Ishikawa

  130. Behavior of absolute densities of atomic oxygen in the gas phase near an object surface in an AC-excited atmospheric pressure He plasma jet

    Article • Applied Physics Express, February 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  131. Characteristics of optical emissions of arc plasma processing for high-rate synthesis of highly crystalline single-walled carbon nanotubes

    Article • Japanese Journal of Applied Physics, February 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  132. Investigation of effects of ion energies on both plasma-induced damage and surface morphologies and optimization of high-temperature Cl2plasma etching of GaN

    Article • Japanese Journal of Applied Physics, January 2017, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  133. Absolute density of precursor SiH3 radicals and H atoms in H2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films

    Article • Applied Physics Letters, January 2017, American Institute of Physics

    Dr Kenji Ishikawa

  134. Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy

    Article • Physical Chemistry Chemical Physics, January 2017, Royal Society of Chemistry

    Dr Kenji Ishikawa

  135. Microfluidic Transport Through Microsized Holes Treated by Nonequilibrium Atmospheric-Pressure Plasma

    Article • IEEE Transactions on Plasma Science, December 2016, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Kenji Ishikawa

  136. Non-thermal atmospheric pressure plasma activates lactate in Ringer’s solution for anti-tumor effects

    Article • Scientific Reports, November 2016, Nature

    Dr Kenji Ishikawa

  137. Effects of assisted magnetic field to an atmospheric-pressure plasma jet on radical generation at the plasma-surface interface and bactericidal function

    Article • Plasma Sources Science and Technology, October 2016, Institute of Physics Publishing

    Dr Kenji Ishikawa

  138. (Invited) Control of Internal Plasma Parameters Toward Atomic Level Processing

    Article • ECS Transactions, September 2016, The Electrochemical Society

    Dr Kenji Ishikawa

  139. Thermal cyclic etching of silicon nitride using formation and desorption of ammonium fluorosilicate

    Article • Applied Physics Express, September 2016, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  140. Cell survival of glioblastoma grown in medium containing hydrogen peroxide and/or nitrite, or in plasma-activated medium

    Article • Archives of Biochemistry and Biophysics, September 2016, Elsevier

    Dr Kenji Ishikawa

  141. Red blood cell coagulation induced by low-temperature plasma treatment

    Article • Archives of Biochemistry and Biophysics, September 2016, Elsevier

    Dr Kenji Ishikawa

  142. Cold plasma interactions with enzymes in foods and model systems

    Article • Trends in Food Science & Technology, September 2016, Elsevier

    Dr Kenji Ishikawa

  143. Synthesis of calcium oxalate crystals in culture medium irradiated with non-equilibrium atmospheric-pressure plasma

    Article • Applied Physics Express, August 2016, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  144. Rapid electron density decay observed by surface-wave probe in afterglow of pulsed fluorocarbon-based plasma

    Article • Japanese Journal of Applied Physics, July 2016, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  145. Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, July 2016, American Vacuum Society

    Dr Kenji Ishikawa

  146. Computational study on SiH4dissociation channels and H abstraction reactions

    Article • Japanese Journal of Applied Physics, June 2016, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  147. Helium-based cold atmospheric plasma-induced reactive oxygen species-mediated apoptotic pathway attenuated by platinum nanoparticles

    Article • Journal of Cellular and Molecular Medicine, June 2016, Wiley

    Dr Kenji Ishikawa

  148. Dry Process

    Article • Japanese Journal of Applied Physics, May 2016, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  149. Effects of nitrogen on the apoptosis of and changes in gene expression in human lymphoma U937 cells exposed to argon-based cold atmospheric pressure plasma

    Article • International Journal of Molecular Medicine, April 2016, Spandidos Publications

    Dr Kenji Ishikawa

  150. Effect of gas residence time on near-edge X-ray absorption fine structures of hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition

    Article • Japanese Journal of Applied Physics, March 2016, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  151. Effects of Radical Species on Structural and Electronic Properties of Amorphous Carbon Films Deposited by Radical-Injection Plasma-Enhanced Chemical Vapor Deposition

    Article • Plasma Processes and Polymers, February 2016, Wiley

    Dr Kenji Ishikawa

  152. Plasma with high electron density and plasma-activated medium for cancer treatment

    Article • Clinical Plasma Medicine, December 2015, Elsevier

    Dr Kenji Ishikawa

  153. Plasma Blood Coagulation Without Involving the Activation of Platelets and Coagulation Factors

    Article • Plasma Processes and Polymers, December 2015, Wiley

    Dr Kenji Ishikawa

  154. Real-time temperature monitoring of Si substrate during plasma processing and its heat-flux analysis

    Article • Japanese Journal of Applied Physics, November 2015, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  155. Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching

    Article • IEEE Transactions on Semiconductor Manufacturing, November 2015, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Kenji Ishikawa

  156. Histological and Nuclear Medical Comparison of Inflammation After Hemostasis with Non-Thermal Plasma and Thermal Coagulation

    Article • Plasma Processes and Polymers, September 2015, Wiley

    Dr Kenji Ishikawa

  157. EPR-Spin Trapping and Flow Cytometric Studies of Free Radicals Generated Using Cold Atmospheric Argon Plasma and X-Ray Irradiation in Aqueous Solutions and Intracellular Milieu

    Article • PLoS ONE, August 2015, PLOS

    Dr Kenji Ishikawa

  158. Suppression of plasma-induced damage on GaN etched by a Cl2plasma at high temperatures

    Article • Japanese Journal of Applied Physics, June 2015, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  159. Electronic properties of HBr, O 2 and Cl 2 used in Si etching

    Article • Japanese Journal of Applied Physics, May 2015, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  160. Silicon nitride (SiN) etching of Ar or Kr diluted CH2F2 plasma

    Article • Japanese Journal of Applied Physics, March 2015, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  161. Plasma diagnostic approach for high rate nanocrystalline Si synthesis in RF/UHF hybrid plasmas using a PECVD process

    Article • Plasma Sources Science and Technology, March 2015, Institute of Physics Publishing

    Dr Kenji Ishikawa

  162. CF3+ fragmentation by electron impact of perfluoro-propyl-vinyl-ethers

    Article • Japanese Journal of Applied Physics, March 2015, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  163. Experimental evidence of warm electron populations in magnetron sputtering plasmas

    Article • Journal of Applied Physics, January 2015, American Institute of Physics

    Dr Kenji Ishikawa

  164. Charge exchange dissociative-ionizations in Ar-diluted CH2F2 plasmas

    Article • Journal of Physics D Applied Physics, January 2015, Institute of Physics Publishing

    Dr Kenji Ishikawa

  165. Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals

    Article • Thin Solid Films, January 2015, Elsevier

    Dr Kenji Ishikawa

  166. Estimation of activation energies for decomposition reaction of polymer by hydrogen radicals generated using hot-wire catalyzer

    Article • Thin Solid Films, January 2015, Elsevier

    Dr Kenji Ishikawa

  167. Plasma Medical Science for Cancer Therapy: Toward Cancer Therapy Using Nonthermal Atmospheric Pressure Plasma

    Article • IEEE Transactions on Plasma Science, December 2014, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Kenji Ishikawa

  168. Quantitative clarification of inactivation mechanism of Penicillium digitatum spores treated with neutral oxygen radicals

    Article • Japanese Journal of Applied Physics, November 2014, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  169. Robust characteristics of semiconductor-substrate temperature measurement by autocorrelation-type frequency-domain low-coherence interferometry

    Article • Japanese Journal of Applied Physics, November 2014, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  170. Effectiveness of plasma diagnostic in ultra high frequency and radio frequency hybrid plasmas for synthesis of silicon nitride film at low temperature

    Article • Journal of Applied Physics, October 2014, American Institute of Physics

    Dr Kenji Ishikawa

  171. Real-time autonomous control of atom density drift during plasma ething

    Article • Journal of Physics D Applied Physics, September 2014, Institute of Physics Publishing

    Dr Kenji Ishikawa

  172. Temporal changes in absolute atom densities in H 2 and N 2 mixture gas plasmas by surface modifications of reactor wall

    Article • Japanese Journal of Applied Physics, April 2014, Institute of Physics Publishing

    Dr Kenji Ishikawa

  173. Epitaxial growth of GaN by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) in the downflow of a very high frequency (VHF) N2/H2 excited plasma – effect of TMG flow rate and VHF power

    Article • Journal of Crystal Growth, April 2014, Elsevier

    Dr Kenji Ishikawa

  174. Hierarchical regrowth of flowerlike nanographene sheets on oxygen-plasma-treated carbon nanowalls

    Article • Applied Physics Express, March 2014, Institute of Physics Publishing

    Dr Kenji Ishikawa

  175. Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls

    Article • Japanese Journal of Applied Physics, March 2014, Institute of Physics Publishing

    Dr Kenji Ishikawa

  176. Nanostructure modification to carbon nanowall surface employing hydrogen peroxide solution

    Article • Japanese Journal of Applied Physics, March 2014, Institute of Physics Publishing

    Dr Kenji Ishikawa

  177. Density control of carbon nanowalls grown by CH4/H2 plasma and their electrical properties

    Article • Carbon, March 2014, Elsevier

    Dr Kenji Ishikawa

  178. Spatiotemporal behaviors of absolute density of atomic oxygen in a planar type of Ar/O 2 non-equilibrium atmospheric-pressure plasma jet

    Article • Plasma Sources Science and Technology, February 2014, Institute of Physics Publishing

    Dr Kenji Ishikawa

  179. Chemical reactions during plasma-enhanced atomic layer deposition of SiO 2 films employing aminosilane and O 2 /Ar plasma at 50 °C

    Article • Japanese Journal of Applied Physics, December 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  180. Effect of Indirect Nonequilibrium Atmospheric Pressure Plasma on Anti-Proliferative Activity against Chronic Chemo-Resistant Ovarian Cancer Cells In Vitro and In Vivo

    Article • PLoS ONE, December 2013, PLOS

    Dr Kenji Ishikawa

  181. Oxidation mechanism of Penicillium digitatum spores through neutral oxygen radicals

    Article • Japanese Journal of Applied Physics, December 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  182. Field Emissions from Organic Nanorods Armored with Metal Nanoparticles

    Article • Japanese Journal of Applied Physics, December 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  183. High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System

    Article • Japanese Journal of Applied Physics, November 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  184. Effect of gas flow on transport of O ( 3 P j ) atoms produced in ac power excited non-equilibrium atmospheric-pressure O 2 /Ar plasma jet

    Article • Journal of Physics D Applied Physics, October 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  185. Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry

    Article • Applied Physics Letters, October 2013, American Institute of Physics

    Dr Kenji Ishikawa

  186. Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2+ NO → F + FNO at an Elevated Temperature

    Article • The Journal of Physical Chemistry C, October 2013, American Chemical Society (ACS)

    Dr Kenji Ishikawa

  187. Inactivation effects of neutral reactive-oxygen species on Penicillium digitatum spores using non-equilibrium atmospheric-pressure oxygen radical source

    Article • Applied Physics Letters, October 2013, American Institute of Physics

    Dr Kenji Ishikawa

  188. Atomic Oxygen Etching from the Top Edges of Carbon Nanowalls

    Article • Applied Physics Express, September 2013, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  189. Photoluminescence Study of Plasma-Induced Damage of GaInN Single Quantum Well

    Article • Japanese Journal of Applied Physics, August 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  190. A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink

    Article • Journal of Physics Conference Series, June 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa, Ph.D. Yukiyasu Kashiwagi

  191. A novel fast and flexible technique of radical kinetic behaviour investigation based on pallet for plasma evaluation structure and numerical analysis

    Article • Journal of Physics D Applied Physics, June 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  192. Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes

    Article • Japanese Journal of Applied Physics, May 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  193. Dissociations of C 5 F 8 and C 5 HF 7 in Etching Plasma

    Article • Japanese Journal of Applied Physics, May 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  194. A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface

    Article • Applied Physics Express, May 2013, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  195. Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO 2 on Carbon Nanowalls

    Article • Applied Physics Express, April 2013, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  196. Room-Temperature Si Etching in NO/F 2 Gases and the Investigation of Surface Reaction Mechanisms

    Article • The Journal of Physical Chemistry C, March 2013, American Chemical Society (ACS)

    Dr Kenji Ishikawa

  197. Surface roughness development on polymers under beam-irradiation

    Article • Journal of Physics D Applied Physics, February 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  198. Etching Enhancement Followed by Nitridation on Low- k SiOCH Film in Ar/C 5 F 10 O Plasma

    Article • Japanese Journal of Applied Physics, February 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  199. Development of High-Density Nitrogen Radical Source for Low Mosaicity and High Rate Growth of InGaN Films in Molecular Beam Epitaxy

    Article • Japanese Journal of Applied Physics, February 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  200. Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells

    Article • Journal of Applied Physics, January 2013, American Institute of Physics

    Dr Kenji Ishikawa

  201. Surface loss probability of H on Si films in SiH4/H2 plasma

    Article • Journal of Applied Physics, January 2013, American Institute of Physics

    Dr Kenji Ishikawa

  202. Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment

    Article • Journal of Applied Physics, January 2013, American Institute of Physics

    Dr Kenji Ishikawa

  203. Highly Selective Etching of SiO 2 over Si 3 N 4 and Si in Capacitively Coupled Plasma Employing C 5 HF 7 Gas

    Article • Japanese Journal of Applied Physics, January 2013, Institute of Physics Publishing

    Dr Kenji Ishikawa

  204. Surface morphology on high-temperature plasma-etched gallium nitride

    Article • Transactions of the Materials Research Society of Japan, January 2013, The Materials Research Society of Japan

    Dr Kenji Ishikawa

  205. Individual Roles of Atoms and Ions during Hydrogen Plasma Passivation of Surface Defects on GaN Created by Plasma Etching

    Article • Japanese Journal of Applied Physics, October 2012, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  206. Critical flux ratio of hydrogen radical to film precursor in microcrystalline silicon deposition for solar cells

    Article • Applied Physics Letters, October 2012, American Institute of Physics

    Dr Kenji Ishikawa

  207. Novel diffraction gratings fabricated by means of plasma nanotechnologies

    Article • September 2012, SPIE

    Dr Kenji Ishikawa

  208. As-grown deep-level defects in n-GaN grown by metal–organic chemical vapor deposition on freestanding GaN

    Article • Journal of Applied Physics, September 2012, American Institute of Physics

    Dr Kenji Ishikawa

  209. Real-time in situ ESR on fungal spores during exposure of oxygen plasmas

    Article • Applied Physics Letters, July 2012, American Institute of Physics

    Dr Kenji Ishikawa

  210. Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature

    Article • AIP Advances, June 2012, American Institute of Physics

    Dr Kenji Ishikawa

  211. Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma

    Article • Applied Physics Express, March 2012, Institute of Physics Publishing

    Dr Kenji Ishikawa

  212. Quantum Chemical Investigation of Si Chemical Dry Etching by Flowing NF$_{3}$ into N$_{2}$ Downflow Plasma

    Article • Japanese Journal of Applied Physics, February 2012, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  213. Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation

    Article • Japanese Journal of Applied Physics, January 2012, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  214. Electron Spin Resonance (ESR) Observation of Radicals on Biological Organism Interacted with Plasmas

    Article • MRS Proceedings, January 2012, Cambridge University Press

    Dr Kenji Ishikawa

  215. Cell survival and proliferation signaling pathways are downregulated by plasma-activated medium in glioblastoma brain tumor cells

    Article • Plasma Medicine, January 2012, Begell House

    Dr Kenji Ishikawa

  216. Quantum Chemical Investigation for Chemical Dry Etching of SiO$_{2}$ by Flowing NF$_{3}$ into H$_{2}$ Downflow Plasma

    Article • Japanese Journal of Applied Physics, December 2011, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  217. Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature

    Article • Japanese Journal of Applied Physics, December 2011, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  218. DC-superposed dual-frequency capacitively coupled plasmas (CCP)

    Article • Journal of Physics D Applied Physics, December 2011, Institute of Physics Publishing

    Dr Kenji Ishikawa

  219. Chemical bond modification in porous SiOCH films by H2 and H2/N2 plasmas investigated by in situ infrared reflection absorption spectroscopy

    Article • Journal of Applied Physics, December 2011, American Institute of Physics

    Dr Kenji Ishikawa

  220. Inactivation ofPenicillium digitatumSpores by a High-Density Ground-State Atomic Oxygen-Radical Source Employing an Atmospheric-Pressure Plasma

    Article • Applied Physics Express, October 2011, Institute of Physics Publishing

    Dr Kenji Ishikawa

  221. Sticking coefficient of hydrogen radicals on ArF photoresist estimated by parallel plate structure in conjunction with numerical analysis

    Article • September 2011, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Kenji Ishikawa

  222. Impacts of CF$^{+}$, CF$_{2}$$^{+}$, CF$_{3}$$^{+}$, and Ar Ion Beam Bombardment with Energies of 100 and 400 eV on Surface Modification of Photoresist

    Article • Japanese Journal of Applied Physics, August 2011, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  223. Analysis of GaN Damage Induced by Cl$_{2}$/SiCl$_{4}$/Ar Plasma

    Article • Japanese Journal of Applied Physics, August 2011, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  224. Real-Time In Situ ESR study of Synergistic Formation of Radical by VUV and H atom

    Article • The Journal of Physical Chemistry Letters, June 2011, American Chemical Society (ACS)

    Dr Kenji Ishikawa

  225. Spatial Distributions of Electron, CF, and CF 2 Radical Densities and Gas Temperature in DC-Superposed Dual-Frequency Capacitively Coupled Plasma Etch Reactor Employing Cyclic-C 4 F 8 /N 2 /Ar Gas

    Article • Japanese Journal of Applied Physics, May 2011, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  226. H2/N2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics

    Article • Journal of Applied Physics, April 2011, American Institute of Physics

    Dr Kenji Ishikawa

  227. Dissociation Channels of c-C 4 F 8 to CF 2 Radical in Reactive Plasma

    Article • Japanese Journal of Applied Physics, March 2011, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  228. Laser Scattering Diagnosis of Atmospheric Pressure Plasma Jet

    Article • Applied Physics Express, January 2011, Institute of Physics Publishing

    Dr Kenji Ishikawa

  229. Behaviors of Absolute Densities of N, H, and NH 3 at Remote Region of High-Density Radical Source Employing N 2 –H 2 Mixture Plasmas

    Article • Japanese Journal of Applied Physics, January 2011, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  230. Hydrophobic treatment of organics against glass employing nonequilibrium atmospheric pressure pulsed plasmas with a mixture of CF4 and N2 gases

    Article • Journal of Applied Physics, January 2011, American Institute of Physics

    Dr Kenji Ishikawa

  231. Plasma-Activated Medium Selectively Kills Glioblastoma Brain Tumor Cells by Down-Regulating a Survival Signaling Molecule, AKT Kinase

    Article • Plasma Medicine, January 2011, Begell House

    Dr Kenji Ishikawa

  232. Measurement of Hydrogen Radical Density and Its Impact on Reduction of Copper Oxide in Atmospheric-Pressure Remote Plasma Using H2and Ar Mixture Gases

    Article • Applied Physics Express, December 2010, Institute of Physics Publishing

    Dr Kenji Ishikawa

  233. A new framework for performance prediction of advanced MOSFETs with plasma-induced recess structure and latent defect site

    Article • December 2008, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Kenji Ishikawa

  234. Enhancing Yield and Reliability by Applying Dry Organic Acid Vapor Cleaning to Copper Contact Via-Bottom for 32-nm Nodes and Beyond

    Article • June 2008, Institute of Electrical & Electronics Engineers (IEEE)

    Dr Kenji Ishikawa

  235. Etching Damage in Diamond Studied Using an Energy-Controlled Oxygen Ion Beam

    Article • Japanese Journal of Applied Physics, January 2007, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  236. Efficient Reduction of Standby Leakage Current in LSIs for Use in Mobile Devices

    Article • Japanese Journal of Applied Physics, April 2006, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  237. Surface reactions of organic films during N2/H2 plasmas etching

    Article • Journal of Applied Physics, April 2006, American Institute of Physics

    Dr Kenji Ishikawa

  238. Structure of diamond surface defective layer damaged by hydrogen ion beam exposure

    Article • Diamond and Related Materials, April 2006, Elsevier

    Dr Kenji Ishikawa

  239. Defect creation in diamond by hydrogen plasma treatment at room temperature

    Article • Physica B Condensed Matter, April 2006, Elsevier

    Dr Kenji Ishikawa

  240. Structural change in diamond by hydrogen plasma treatment at room temperature

    Article • Diamond and Related Materials, November 2005, Elsevier

    Dr Kenji Ishikawa

  241. Dangling bonds created during plasma etching of silicon dioxide films

    Article • Applied Physics Letters, June 2005, American Institute of Physics

    Dr Kenji Ishikawa

  242. Mass-analyzed CFx+ (x=1,2,3) ion beam study on selectivity of SiO2-to-SiN etching and a-C:F film deposition

    Article • Journal of Applied Physics, March 2005, American Institute of Physics

    Dr Kenji Ishikawa

  243. Etching yield of SiO[sub 2] irradiated by F[sup +], CF[sub x][sup +] (x=1,2,3) ion with energies from 250 to 2000 eV

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, January 2004, American Vacuum Society

    Dr Kenji Ishikawa

  244. Surface and gas-phase observations of Ar-diluted c-C4F8 plasma by using real-time infrared spectroscopy and planar laser-induced fluorescence

    Article • Journal of Applied Physics, February 2003, American Institute of Physics

    Dr Kenji Ishikawa

  245. Transitional change from etching to deposition under CF+ ion irradiation

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, January 2003, American Vacuum Society

    Dr Kenji Ishikawa

  246. In vacuo electron-spin-resonance study on amorphous fluorinated carbon films for understanding of surface chemical reactions in plasma etching

    Article • Applied Physics Letters, September 2002, American Institute of Physics

    Dr Kenji Ishikawa

  247. Planar Laser-Induced Fluorescence of Fluorocarbon Radicals in Oxide Etch Process Plasma

    Article • Japanese Journal of Applied Physics, April 2002, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  248. Direct observation of surface dangling bonds during plasma process: chemical reactions during H2 and Ar plasma treatments

    Article • Thin Solid Films, March 2002, Elsevier

    Dr Kenji Ishikawa

  249. Early-stage modification of a silicon oxide surface in fluorocarbon plasma

    Article • Journal of Applied Physics, February 2002, American Institute of Physics

    Dr Kenji Ishikawa

  250. In–situ Time–Resolved Infrared Spectroscopic Study of Silicon–Oxide Surface during Selective Etching over Silicon in Fluorocarbon Plasma

    Article • Japanese Journal of Applied Physics, December 2000, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  251. Infrared dielectric function for asymmetric peak line shape

    Article • Journal of Applied Physics, December 2000, American Institute of Physics

    Dr Kenji Ishikawa

  252. Thickness-deconvolved structural properties of thermally grown silicon dioxide films

    Article • Journal of Applied Physics, September 1999, American Institute of Physics

    Dr Kenji Ishikawa

  253. Contribution of interface roughness to the infrared spectra of thermally grown silicon dioxide films

    Article • Journal of Applied Physics, April 1999, American Institute of Physics

    Dr Kenji Ishikawa

  254. Analysis of native oxide growth process on an atomically flattened and hydrogen terminated Si (111) surface in pure water using Fourier transformed infrared reflection absorption spectroscopy

    Article • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, January 1998, American Vacuum Society

    Dr Kenji Ishikawa

  255. Dependence of TO and LO mode frequency of thermally grown silicon dioxide films on annealing temperature

    Article • Applied Surface Science, June 1997, Elsevier

    Dr Kenji Ishikawa

  256. Initial stage of native oxide growth on hydrogen terminated silicon (111) surfaces

    Article • Journal of Applied Physics, January 1996, American Institute of Physics

    Dr Kenji Ishikawa

  257. Infrared Spectroscopy Study of Chemical Oxides Formed by a Sequence of RCA Standard Cleaning Treatments

    Article • Journal of The Electrochemical Society, January 1996, The Electrochemical Society

    Dr Kenji Ishikawa

  258. Effects of Dissolved Oxygen in HF Solution on Silicon Surface Morphology

    Article • Japanese Journal of Applied Physics, February 1995, Japan Society of Applied Physics

    Dr Kenji Ishikawa

  259. Native Oxide Characterization on Silicon Surfaces

    Article • January 1994, Elsevier

    Dr Kenji Ishikawa

  260. FT-IR-RAS ANALYSIS OF THE STRUCTURE OF THE SiO2/Si INTERFACE

    Article • January 1994, Elsevier

    Dr Kenji Ishikawa

  261. Observation of Thin SiO2 Films Using IR-RAS

    Article • January 1993, Springer Science + Business Media

    Dr Kenji Ishikawa

  262. An in-situ time-resolved infrared spectroscopic study of silicon dioxide (SiO/sub 2/) surface during selective etching over silicon in fluorocarbon plasma

    Article • Institute of Electrical & Electronics Engineers (IEEE)

    Dr Kenji Ishikawa