Electron beam-enhanced etching of InAs in Cl2 gas and novel in situ patterning of GaAs with an InAs mask layer

S. Miya, T. Yoshida, Y. Kadoya, B. Akamatsu, H. Noge, H. Kano, H. Sakaki
  • Frontiers in Human Neuroscience, January 1993, American Institute of Physics
  • DOI: 10.1063/1.110663

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http://dx.doi.org/10.1063/1.110663

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