What is it about?
This article presents a nonisothermal physicochemical model of reactive sputtering. The model is used to simulate reactive sputtering of a "sandwich" target. This type of targets has two plates of different metals located on the same axis. The physical model of the process is described by a system of 14 algebraic equations.
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Why is it important?
Reactive magnetron sputtering is a widely used method to produce (or actually deposit) films, which are further applied in microelectronics, optoelectronics, solar energy, etc. Complex nonlinear relationships between controlled parameters and dependent variables during reactive magnetron sputtering make it difficult to control the film deposition process. To overcome this problem it is necessary to develop simulation of the process. Our model can be used to estimate the values of independent parameters that ensure the deposition of a compound film in a real technological process.
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This page is a summary of: Physicochemical model for reactive sputtering of a sandwich target, Journal of Applied Physics, February 2023, American Institute of Physics, DOI: 10.1063/5.0128399.
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Nonisothermal chemical model of reactive sputtering
A kinetic model of reactive sputtering is proposed to modify the Berg model by taking into account the true chemical interaction at solid surfaces of the target, substrate, and chamber wall having different temperatures.
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