What is it about?
This article is about a novel approach to photodetection using controlled wrinkling and oblique angle material deposition methods. The researchers created a metal-semiconductor grating with interconnected nanobars that leads to an increase in resistance on illumination, rather than the expected decrease. They also added an amorphous titania layer to enhance the current reduction on photoexcitation. The article discusses the fabrication process, characterization, and photoresponse of the proposed metal-semiconductor geometry.
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Why is it important?
This research is important because it presents a new approach to photodetection that can be used in various applications, such as sensing, polarizing spectral filtering, structural color filtering, bandgap tuning, and beam steering. The controlled wrinkling and oblique angle material deposition methods used in this study can also be applied to other fields, such as photocatalysis and photovoltaics.
Perspectives
As a perspective, this article opens up new possibilities for the development of flexible and large-area photodetectors with high sensitivity and selectivity. The proposed metal-semiconductor geometry can be further optimized by adjusting the nanobar dimensions, the metal deposition angle, and the semiconductor material properties. The use of amorphous titania layer can also be explored in other metal-semiconductor nanostructures for enhanced photoresponse.
Dr. Swagato Sarkar
Leibniz-Institut für Polymerforschung Dresden e. V.
Read the Original
This page is a summary of: Plasmonic Photoresistor Based on Interconnected Metal‐Semiconductor Grating, Advanced Functional Materials, March 2023, Wiley,
DOI: 10.1002/adfm.202210172.
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