All Stories

  1. Controlling cantilevered adaptive X-ray mirrors

    Article • Journal of Synchrotron Radiation, August 2024, International Union of Crystallography

    Dr. Kenneth A Goldberg

  2. Beamline Optics and Modeling School (BLOMS) 2023

    Article • Synchrotron Radiation News, September 2023, Taylor & Francis

    Dr. Kenneth A Goldberg

  3. Thickness dependence of piezo-bimorph adaptive mirror bending

    Article • Review of Scientific Instruments, July 2023, American Institute of Physics

    Dr. Kenneth A Goldberg

  4. Real-time machine-learning-driven control system of a deformable mirror for achieving aberration-free X-ray wavefronts

    Article • Optics Express, June 2023, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  5. Off-axis representation of hyperbolic mirror shapes for X-ray beamlines

    Article • Journal of Synchrotron Radiation, March 2023, International Union of Crystallography

    Dr. Kenneth A Goldberg

  6. Data-driven modeling and control of an X-ray bimorph adaptive mirror

    Article • Journal of Synchrotron Radiation, January 2023, International Union of Crystallography

    Dr. Kenneth A Goldberg

  7. Derivation of closed-form ellipsoidal X-ray mirror shapes from Fermat's principle

    Article • Journal of Synchrotron Radiation, June 2022, International Union of Crystallography

    Dr. Kenneth A Goldberg

  8. Analytic descriptions of parabolic X-ray mirrors

    Article • Journal of Synchrotron Radiation, May 2022, International Union of Crystallography

    Dr. Kenneth A Goldberg

  9. Simulations of applications using diaboloid mirrors

    Article • Journal of Synchrotron Radiation, June 2021, International Union of Crystallography

    Manuel Sanchez del Rio, Dr. Kenneth A Goldberg

  10. Diaboloidal mirrors: algebraic solution and surface shape approximations

    Article • Journal of Synchrotron Radiation, June 2021, International Union of Crystallography

    Dr. Valeriy V Yashchuk, Dr. Kenneth A Goldberg

  11. Pseudo-gray-scale halftone gratings for shearing and Hartmann wavefront sensors

    Article • Optics Letters, February 2021, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  12. Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors

    Article • Sensors, January 2021, MDPI AG

    Dr. Kenneth A Goldberg

  13. Experimental verification of high-NA imaging simulations using SHARP

    Article • October 2020, SPIE

    Dr. Kenneth A Goldberg

  14. Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing

    Article • Optics Letters, August 2020, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  15. Compensation of heat load deformations using adaptive optics for the ALS upgrade: a wave optics study

    Article • Journal of Synchrotron Radiation, August 2020, International Union of Crystallography

    Dr. Kenneth A Goldberg

  16. Extreme ultraviolet microscope characterization using photomask surface roughness

    Article • Scientific Reports, July 2020, Springer Science + Business Media

    Dr. Kenneth A Goldberg

  17. Adaptive shape control of wavefront-preserving X-ray mirrors with active cooling and heating

    Article • Optics Express, June 2020, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  18. Collaborative development of diffraction-limited beamline optical systems at US DOE light sources

    Article • September 2019, SPIE

    Dr. Kenneth A Goldberg

  19. Front Matter: Volume 10957

    Article • April 2019, SPIE

    Dr. Kenneth A Goldberg

  20. Upgrade to the SHARP EUV mask microscope

    Article • March 2019, SPIE

    Dr. Kenneth A Goldberg

  21. A New Light for Berkeley Lab—the Advanced Light Source Upgrade

    Article • Synchrotron Radiation News, January 2019, Taylor & Francis

    Dr. Kenneth A Goldberg

  22. Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors

    Article • September 2018, SPIE

    Dr. Kenneth A Goldberg

  23. EUV photolithography mask inspection using Fourier ptychography

    Article • May 2018, SPIE

    Dr. Kenneth A Goldberg

  24. Front Matter: Volume 10583

    Article • May 2018, SPIE

    Dr. Kenneth A Goldberg

  25. Field-varying aberration recovery in EUV microscopy using mask roughness

    Article • January 2018, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  26. Taking a SHARP look at mask 3D effects

    Article • October 2017, SPIE

    Dr. Kenneth A Goldberg

  27. Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope

    Article • October 2017, SPIE

    Dr. Kenneth A Goldberg

  28. Image-based pupil plane characterization via a space-domain basis

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, June 2017, SPIE

    Dr. Kenneth A Goldberg

  29. Front Matter: Volume 10143

    Article • May 2017, SPIE

    Dr. Kenneth A Goldberg

  30. Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging

    Article • Applied Optics, April 2017, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  31. Front Matter: Volume 9776

    Article • August 2016, SPIE

    Dr. Kenneth A Goldberg

  32. Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, July 2016, SPIE

    Dr. Kenneth A Goldberg

  33. Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, June 2016, SPIE

    Dr. Kenneth A Goldberg

  34. Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

    Article • May 2016, SPIE

    Dr. Kenneth A Goldberg

  35. Optimized mirror shape tuning using beam weightings based on distance, angle of incidence, reflectivity, and power

    Article • Review of Scientific Instruments, May 2016, American Institute of Physics

    Dr. Valeriy V Yashchuk, Dr. Kenneth A Goldberg

  36. Preface: The 5th International Workshop on X-ray Mirror Design, Fabrication, and Metrology

    Article • Review of Scientific Instruments, May 2016, American Institute of Physics

    Dr. Valeriy V Yashchuk, Dr. Kenneth A Goldberg

  37. Emulation of anamorphic imaging on the SHARP EUV mask microscope

    Article • March 2016, SPIE

    Dr. Kenneth A Goldberg

  38. Image-based pupil plane characterization via principal component analysis for EUVL tools

    Article • March 2016, SPIE

    Dr. Kenneth A Goldberg

  39. Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks

    Article • March 2016, SPIE

    Dr. Kenneth A Goldberg

  40. Multiplexed high resolution soft x-ray RIXS

    Article • January 2016, American Institute of Physics

    Dr. Kenneth A Goldberg

  41. Off-axis aberration estimation in an EUV microscope using natural speckle

    Article • January 2016, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  42. EUV actinic brightfield mask microscopy for predicting printed defect images

    Article • November 2015, SPIE

    Dr. Kenneth A Goldberg

  43. Examination of phase retrieval algorithms for patterned EUV mask metrology

    Article • November 2015, SPIE

    Dr. Kenneth A Goldberg

  44. Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

    Article • Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, November 2015, American Vacuum Society

    Dr. Kenneth A Goldberg

  45. EUV Research at Berkeley Lab: Enabling Technologies and Applications

    Article • September 2015, Springer Science + Business Media

    Dr. Kenneth A Goldberg

  46. Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging

    Article • July 2015, SPIE

    Dr. Kenneth A Goldberg

  47. Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, May 2015, SPIE

    Dr. Kenneth A Goldberg

  48. Modal wavefront reconstruction from its gradient

    Article • Applied Optics, April 2015, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  49. Aberration estimation using EUV mask roughness

    Article • March 2015, SPIE

    Dr. Kenneth A Goldberg

  50. Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement

    Article • March 2015, SPIE

    Dr. Kenneth A Goldberg

  51. A method of image-based aberration metrology for EUVL tools

    Article • March 2015, SPIE

    Dr. Kenneth A Goldberg

  52. Phase measurements of EUV mask defects

    Article • March 2015, SPIE

    Ms Rebeckah Aubertin, Dr. Kenneth A Goldberg

  53. Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection

    Article • March 2015, SPIE

    Dr. Kenneth A Goldberg

  54. New ways of looking at masks with the SHARP EUV microscope

    Article • March 2015, SPIE

    Dr. Kenneth A Goldberg

  55. Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

    Article • March 2015, SPIE

    Dr. Kenneth A Goldberg

  56. Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects

    Article • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, February 2015, American Vacuum Society

    Dr. Kenneth A Goldberg

  57. Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, February 2015, SPIE

    Dr. Kenneth A Goldberg

  58. Enabling EUV Resist Research at the 1x and Smaller Regime

    Article • Journal of Photopolymer Science and Technology, January 2015, Technical Association of Photopolymers, Japan

    Dr. Kenneth A Goldberg

  59. Partially Coherent Quantitative Phase Retrieval for EUV Lithography

    Article • January 2015, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  60. Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source

    Article • Journal of the Optical Society of America A, November 2014, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  61. Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

    Article • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, November 2014, American Vacuum Society

    Dr. Kenneth A Goldberg

  62. A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

    Article • October 2014, SPIE

    Dr. Kenneth A Goldberg

  63. Phase-enhanced defect sensitivity for EUV mask inspection

    Article • October 2014, SPIE

    Dr. Kenneth A Goldberg

  64. Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source

    Article • Optics Express, August 2014, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  65. Extreme ultraviolet mask roughness: requirements, characterization, and modeling

    Article • July 2014, SPIE

    Dr. Kenneth A Goldberg

  66. Actinic mask imaging: recent results and future directions from the SHARP EUV microscope

    Article • April 2014, SPIE

    Dr. Kenneth A Goldberg

  67. Recovering effective amplitude and phase roughness of EUV masks

    Article • September 2013, SPIE

    Dr. Kenneth A Goldberg

  68. Increased depth of field through wave-front coding: using an off-axis zone plate lens with cubic phase modulation in an EUV microscope

    Article • September 2013, SPIE

    Dr. Kenneth A Goldberg

  69. The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

    Article • September 2013, SPIE

    Dr. Kenneth A Goldberg

  70. Pupil shaping and coherence control in an EUV mask-imaging microscope

    Article • September 2013, SPIE

    Dr. Kenneth A Goldberg

  71. Metrology for the Advancement of X-ray Optics at the ALS

    Article • Synchrotron Radiation News, September 2013, Taylor & Francis

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  72. In situ fine tuning of bendable soft x-ray mirrors using a lateral shearing interferometer

    Article • Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment, May 2013, Elsevier

    Dr. Kenneth A Goldberg

  73. Application of phase shift focus monitor in EUVL process control

    Article • April 2013, SPIE

    Dr. Kenneth A Goldberg

  74. Commissioning an EUV mask microscope for lithography generations reaching 8 nm

    Article • April 2013, SPIE

    Dr. Kenneth A Goldberg

  75. Experimental methods for optimal tuning of bendable mirrors for diffraction-limited soft x-ray focusing

    Article • Journal of Physics Conference Series, March 2013, Institute of Physics Publishing

    Dr. Kenneth A Goldberg

  76. Methodology for optimal in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays

    Article • Optical Engineering, March 2013, SPIE

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  77. Ex situ tuning of bendable x-ray mirrors for optimal beamline performance

    Article • October 2012, SPIE

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  78. Methodology for optimal in situ alignment and setting of bendable optics for diffraction-limited focusing of soft x-rays

    Article • October 2012, SPIE

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  79. EUV actinic imaging tool aerial image evaluation of EUVL embedded phase shift mask performance

    Article • March 2012, SPIE

    Dr. Kenneth A Goldberg

  80. EUV mask multilayer defects and their printability under different multilayer deposition conditions

    Article • March 2012, SPIE

    Dr. Kenneth A Goldberg

  81. Printability study of pattern defects in the EUV mask as a function of hp nodes

    Article • March 2012, SPIE

    Dr. Kenneth A Goldberg

  82. Accelerating EUV learning with synchrotron light: mask roughness challenges ahead

    Article • October 2011, SPIE

    Dr. Kenneth A Goldberg

  83. Printability of native blank defects and programmed defects and their stack structures

    Article • October 2011, SPIE

    Dr. Kenneth A Goldberg

  84. Mask roughness challenges in extreme ultraviolet mask development

    Article • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, October 2011, American Vacuum Society

    Dr. Kenneth A Goldberg

  85. An experimental apparatus for diffraction-limited soft x-ray nano-focusing

    Article • September 2011, SPIE

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  86. Design optimization of bendable x-ray mirrors

    Article • September 2011, SPIE

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  87. Development of in situ, at-wavelength metrology for soft X-ray nano-focusing

    Article • Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment, September 2011, Elsevier

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  88. Characterization of Mo/Si multilayer growth on stepped topographies

    Article • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, September 2011, American Vacuum Society

    Dr. Kenneth A Goldberg

  89. Optical modeling of Fresnel zoneplate microscopes

    Article • Applied Optics, July 2011, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  90. Cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror

    Article • Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment, April 2011, Elsevier

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  91. An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm

    Article • March 2011, SPIE

    Dr. Kenneth A Goldberg

  92. Quantitative evaluation of mask phase defects from through-focus EUV aerial images

    Article • March 2011, SPIE

    Dr. Kenneth A Goldberg

  93. Critical challenges for EUV resist materials

    Article • March 2011, SPIE

    Dr. Kenneth A Goldberg

  94. Printability and inspectability of defects on the EUV mask for sub-32nm half pitch HVM application

    Article • March 2011, SPIE

    Dr. Kenneth A Goldberg

  95. Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness

    Article • March 2011, SPIE

    Dr. Kenneth A Goldberg

  96. The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch

    Article • March 2011, SPIE

    Dr. Kenneth A Goldberg

  97. Using synchrotron light to accelerate EUV resist and mask materials learning

    Article • February 2011, SPIE

    Dr. Kenneth A Goldberg

  98. Actinic characterization of extreme ultraviolet bump-type phase defects

    Article • January 2011, American Vacuum Society

    Dr. Kenneth A Goldberg

  99. Reflection microscope for actinic mask inspection and other progress in soft x-ray laser nano-imaging

    Article • January 2011, Springer Science + Business Media

    Dr. Kenneth A Goldberg

  100. Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning

    Article • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, November 2010, American Vacuum Society

    Dr. Kenneth A Goldberg

  101. Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks

    Article • November 2010, Institute of Electrical & Electronics Engineers (IEEE)

    Dr. Kenneth A Goldberg

  102. Photon flux requirements for extreme ultraviolet reticle imaging in the 22- and 16-nm nodes

    Article • Journal of Micro/Nanolithography MEMS and MOEMS, October 2010, SPIE

    Dr. Kenneth A Goldberg

  103. At-wavelength optical metrology development at the ALS

    Article • August 2010, SPIE

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  104. Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks

    Article • Optics Express, June 2010, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  105. Photon flux requirements for EUV reticle imaging microscopy in the 22- and 16nm nodes

    Article • March 2010, SPIE

    Dr. Kenneth A Goldberg

  106. Actinic imaging of native and programmed defects on a full-field mask

    Article • March 2010, SPIE

    Dr. Kenneth A Goldberg

  107. EUV-multilayers on grating-like topographies

    Article • March 2010, SPIE

    Dr. Kenneth A Goldberg

  108. A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection

    Article • March 2010, SPIE

    Dr. Kenneth A Goldberg

  109. Carbon contamination topography analysis of EUV masks

    Article • March 2010, SPIE

    Dr. Kenneth A Goldberg

  110. Particle removal challenges of EUV patterned masks for the sub-22nm HP node

    Article • March 2010, SPIE

    Dr. Kenneth A Goldberg

  111. Printability and inspectability of programmed pit defects on the masks in EUV lithography

    Article • March 2010, SPIE

    Dr. Kenneth A Goldberg

  112. The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch

    Article • March 2010, SPIE

    Dr. Kenneth A Goldberg

  113. Effect of carbon contamination on the printing performance of extreme ultraviolet masks

    Article • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, March 2010, American Vacuum Society

    Dr. Kenneth A Goldberg

  114. Study of real defects on EUV blanks and a strategy for EUV mask inspection

    Article • February 2010, SPIE

    Dr. Kenneth A Goldberg

  115. Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research

    Article • January 2010, American Vacuum Society

    Dr. Kenneth A Goldberg

  116. Actinic imaging and evaluation of phase structures on extreme ultraviolet lithography masks

    Article • January 2010, American Vacuum Society

    Dr. Kenneth A Goldberg

  117. Surface Slope Metrology on Deformable Soft X-ray Mirrors

    Article • January 2010, American Institute of Physics

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  118. Elliptically Bent X-Ray Mirrors with Active Temperature Stabilization

    Article • X-Ray Optics and Instrumentation, January 2010, Hindawi Publishing Corporation

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  119. Table-top Extreme Ultraviolet Laser Aerial Imaging of Lithographic Masks

    Article • January 2010, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  120. Table-top microscope for at-wavelength inspection of extreme ultraviolet lithography mask

    Article • October 2009, Institute of Electrical & Electronics Engineers (IEEE)

    Professor Przemyslaw W Wachulak, Dr. Kenneth A Goldberg

  121. Investigation of buried EUV mask defect printability using actinic inspection and fast simulation

    Article • October 2009, SPIE

    Dr. Kenneth A Goldberg

  122. Advances in full field microscopy with table-top soft x-ray lasers

    Article • August 2009, SPIE

    Dr. Igor A. Artyukov, Dr. Kenneth A Goldberg

  123. Thorough characterization of an EUV mask

    Article • April 2009, SPIE

    Dr. Kenneth A Goldberg

  124. 22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

    Article • Microelectronic Engineering, April 2009, Elsevier

    Dr. Kenneth A Goldberg

  125. Collecting EUV mask images through focus by wavelength tuning

    Article • March 2009, SPIE

    Dr. Kenneth A Goldberg

  126. Mask defect verification using actinic inspection and defect mitigation technology

    Article • March 2009, SPIE

    Dr. Kenneth A Goldberg

  127. Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging

    Article • March 2009, SPIE

    Dr. Kenneth A Goldberg

  128. Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects

    Article • March 2009, SPIE

    Dr. Kenneth A Goldberg

  129. Improving the performance of the actinic inspection tool with an optimized alignment procedure

    Article • March 2009, SPIE

    Dr. Kenneth A Goldberg

  130. Inspection 13.2-nm table-top full-field microscope

    Article • March 2009, SPIE

    Dr. Kenneth A Goldberg

  131. The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond

    Article • March 2009, SPIE

    Dr. Kenneth A Goldberg

  132. EUV actinic defect inspection and defect printability at the sub-32-nm half-pitch

    Article • January 2009, SPIE

    Dr. Kenneth A Goldberg

  133. Microscopy of extreme ultraviolet lithography masks with 132 nm tabletop laser illumination

    Article • Optics Letters, January 2009, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  134. 13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization

    Article • January 2009, Optical Society of America (OSA)

    Professor Przemyslaw W Wachulak, Dr. Kenneth A Goldberg

  135. At-Wavelength and Optical Metrology of Bendable X-Ray Optics for Nanofocusing at the ALS

    Article • January 2009, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg, Dr. Valeriy V Yashchuk

  136. Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features

    Article • Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, January 2009, American Vacuum Society

    Dr. Kenneth A Goldberg

  137. EUV pattern defect detection sensitivity based on aerial image linewidth measurements

    Article • Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, January 2009, American Vacuum Society

    Dr. Kenneth A Goldberg

  138. Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

    Article • Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, January 2009, American Vacuum Society

    Dr. Kenneth A Goldberg

  139. Pushing extreme ultraviolet lithography development beyond 22 nm half pitch

    Article • Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, January 2009, American Vacuum Society

    Dr. Kenneth A Goldberg

  140. Actinic extreme ultraviolet mask inspection beyond 0.25numericalaperture

    Article • Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, November 2008, American Vacuum Society

    Dr. Kenneth A Goldberg

  141. Benchmarking EUV mask inspection beyond 0.25 NA

    Article • October 2008, SPIE

    Dr. Kenneth A Goldberg

  142. Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool

    Article • March 2008, SPIE

    Dr. Kenneth A Goldberg

  143. Determining the critical size of EUV mask substrate defects

    Article • March 2008, SPIE

    Dr. Kenneth A Goldberg

  144. EUV mask reflectivity measurements with micron-scale spatial resolution

    Article • March 2008, SPIE

    Dr. Kenneth A Goldberg

  145. Performance of actinic EUVL mask imaging using a zoneplate microscope

    Article • October 2007, SPIE

    Dr. Kenneth A Goldberg

  146. Detectability and printability of EUVL mask blank defects for the 32-nm HP node

    Article • October 2007, SPIE

    Dr. Kenneth A Goldberg

  147. EUV and non-EUV inspection of reticle defect repair sites

    Article • March 2007, SPIE

    Dr. Kenneth A Goldberg

  148. EUV MET printing and actinic imaging analysis on the effects of phase defects on wafer CDs

    Article • March 2007, SPIE

    Dr. Kenneth A Goldberg

  149. Recent results from the Berkeley 0.3-NA EUV microfield exposure tool

    Article • March 2007, SPIE

    Dr. Kenneth A Goldberg

  150. Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

    Article • Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, January 2007, American Vacuum Society

    Dr. Kenneth A Goldberg

  151. Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques

    Article • October 2006, SPIE

    Dr. Kenneth A Goldberg

  152. Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator

    Article • Applied Optics, March 2006, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  153. Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists

    Article • March 2006, SPIE

    Dr. Kenneth A Goldberg

  154. Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool

    Article • March 2006, SPIE

    Dr. Kenneth A Goldberg

  155. Testing EUV optics with EUV light: If you can measure it, you can make it

    Article • SPIE Newsroom, January 2006, SPIE

    Dr. Kenneth A Goldberg

  156. Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic

    Article • IEEE Journal of Quantum Electronics, January 2006, Institute of Electrical & Electronics Engineers (IEEE)

    Dr. Kenneth A Goldberg

  157. Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements

    Article • Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, January 2006, American Vacuum Society

    Dr. Kenneth A Goldberg

  158. Ultra-high accuracy optical testing: creating diffraction-limited short-wavelength optical systems

    Article • August 2005, SPIE

    Dr. Kenneth A Goldberg

  159. X-ray beam metrology and x-ray optic alignment by Hartmann wavefront sensing

    Article • August 2005, SPIE

    Dr. Kenneth A Goldberg

  160. EUV focus sensor: design and modeling

    Article • May 2005, SPIE

    Dr James Alexander Liddle, Dr. Kenneth A Goldberg

  161. EUV microexposures at the ALS using the 0.3-NA MET projection optics

    Article • May 2005, SPIE

    Dr. Kenneth A Goldberg

  162. Performance of EUV photoresists on the ALS micro exposure tool

    Article • May 2005, SPIE

    Dr. Kenneth A Goldberg

  163. Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2005, American Vacuum Society

    Dr. Kenneth A Goldberg

  164. Extreme ultraviolet focus sensor design optimization

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2005, American Vacuum Society

    Dr. Kenneth A Goldberg

  165. Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2005, American Vacuum Society

    Dr. Kenneth A Goldberg

  166. Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2005, American Vacuum Society

    Dr. Kenneth A Goldberg

  167. EUV interferometric testing and alignment of the 0.3-NA MET optic

    Article • May 2004, SPIE

    Dr. Kenneth A Goldberg

  168. EUV resist imaging below 50 nm using coherent spatial filtering techniques

    Article • May 2004, SPIE

    Dr. Kenneth A Goldberg

  169. Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic

    Article • May 2004, SPIE

    Dr. Kenneth A Goldberg

  170. Recent developments in X-UV optics and X-UV diagnostics

    Article • Applied Physics B Photophysics and Laser Chemistry, May 2004, Springer Science + Business Media

    Dr. Kenneth A Goldberg

  171. At-Wavelength Interferometry of High-NA Diffraction-Limited EUV Optics

    Article • January 2004, American Institute of Physics

    Dr. Kenneth A Goldberg

  172. A Synchrotron-Based Fourier-Synthesis Custom-Coherence Illuminator

    Article • January 2004, American Institute of Physics

    Dr. Kenneth A Goldberg

  173. X ray Wavefront Hartmann Sensor

    Article • January 2004, American Institute of Physics

    Dr. Kenneth A Goldberg

  174. At-wavelength alignment and testing of the 0.3 NA MET optic

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2004, American Vacuum Society

    Dr. Kenneth A Goldberg

  175. Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2004, American Vacuum Society

    Dr. Kenneth A Goldberg

  176. New techniques for the measurement of x-ray beam or x-ray optics quality

    Article • December 2003, SPIE

    Dr. Kenneth A Goldberg

  177. Hartmann wave-front measurement at 134 nm with λ_EUV/120 accuracy

    Article • Optics Letters, September 2003, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  178. EUV interferometry of the 0.3-NA MET optic

    Article • June 2003, SPIE

    Dr. Kenneth A Goldberg

  179. Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling

    Article • June 2003, SPIE

    Dr. Kenneth A Goldberg

  180. Effects of radiation-induced carbon contamination on the performance of an EUV lithographic optic

    Article • June 2003, SPIE

    Dr. Kenneth A Goldberg

  181. Resist evauation at 50 nm in the EUV using interferometric spatial-frequency-doubled imaging

    Article • June 2003, SPIE

    Dr. Kenneth A Goldberg

  182. Static EUV micro-exposures using the ETS Set-2 optics

    Article • June 2003, SPIE

    Dr. Kenneth A Goldberg

  183. System and process learning in a full-field, high-power EUVL alpha tool

    Article • June 2003, SPIE

    Dr. Kenneth A Goldberg

  184. Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

    Article • Applied Optics, February 2003, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  185. Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2003, American Vacuum Society

    Dr. Kenneth A Goldberg

  186. Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2003, American Vacuum Society

    Dr. Kenneth A Goldberg

  187. Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2003, American Vacuum Society

    Dr. Kenneth A Goldberg

  188. Fourier transform interferometer alignment method

    Article • Applied Optics, August 2002, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  189. Honing the accuracy of extreme-ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic

    Article • July 2002, SPIE

    Dr. Kenneth A Goldberg

  190. Lithographic evaluation of the EUV engineering test stand

    Article • July 2002, SPIE

    Dr. Kenneth A Goldberg

  191. Performance upgrades in the EUV engineering test stand

    Article • July 2002, SPIE

    Dr. Kenneth A Goldberg

  192. Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

    Article • July 2002, SPIE

    Dr. Kenneth A Goldberg

  193. Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer

    Article • Optics Letters, June 2002, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  194. Testing extreme ultraviolet optics with visible-light and extreme ultraviolet interferometry

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2002, American Vacuum Society

    Dr. Kenneth A Goldberg, Professor Henry N Chapman

  195. Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2002, American Vacuum Society

    Professor Henry N Chapman, Dr. Kenneth A Goldberg

  196. Soft X-Ray Microscopy and EUV Lithography: An Update on Imaging at 20–40 nm Spatial Resolution

    Article • January 2002, American Institute of Physics

    Dr. Kenneth A Goldberg

  197. Current Status of the EUV Engineering Test Stand.

    Article • Journal of Photopolymer Science and Technology, January 2002, Technical Association of Photopolymers, Japan

    Dr. Kenneth A Goldberg

  198. <title>Initial results from the EUV engineering test stand</title>

    Article • December 2001, SPIE

    Dr. Kenneth A Goldberg

  199. Wave-front measurement errors from restricted concentric subdomains

    Article • Journal of the Optical Society of America A, September 2001, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  200. <title>Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer</title>

    Article • August 2001, SPIE

    Dr. Kenneth A Goldberg

  201. <title>Extremely fine-pitch printing with a 10X Schwarzschild optic at extreme-ultraviolet wavelengths</title>

    Article • August 2001, SPIE

    Dr. Kenneth A Goldberg

  202. <title>System integration and performance of the EUV engineering test stand</title>

    Article • August 2001, SPIE

    Dr. Kenneth A Goldberg

  203. Tolerancing of diffraction-limited Kirkpatrick–Baez synchrotron beamline optics for extreme-ultraviolet metrology

    Article • Applied Optics, August 2001, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  204. Fourier-transform method of phase-shift determination

    Article • Applied Optics, June 2001, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  205. Extreme-ultraviolet lensless Fourier-transform holography

    Article • Applied Optics, June 2001, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  206. At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2001, American Vacuum Society

    Dr. Kenneth A Goldberg

  207. First lithographic results from the extreme ultraviolet Engineering Test Stand

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2001, American Vacuum Society

    Dr. Kenneth A Goldberg

  208. Phase-shifting point-diffraction interferometry at 193 nm

    Article • Applied Optics, November 2000, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  209. EUV interferometry of a four-mirror ring-field EUV optical system

    Article • July 2000, SPIE

    Dr. Kenneth A Goldberg

  210. <title>EUV engineering test stand</title>

    Article • July 2000, SPIE

    Dr. Kenneth A Goldberg

  211. <title>EUV holographic aerial image recording</title>

    Article • July 2000, SPIE

    Dr. Kenneth A Goldberg

  212. At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems

    Article • Applied Optics, June 2000, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  213. <title>At-wavelength characterization of DUV-radiation-induced damage in fused silica</title>

    Article • June 2000, SPIE

    Dr. Kenneth A Goldberg

  214. Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2000, American Vacuum Society

    Dr. Kenneth A Goldberg

  215. Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2000, American Vacuum Society

    Dr. Kenneth A Goldberg

  216. Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterization

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2000, American Vacuum Society

    Dr. Kenneth A Goldberg

  217. The EUV phase-shifting point diffraction interferometer

    Article • January 2000, American Institute of Physics

    Dr. Kenneth A Goldberg

  218. The PS/PDI: A high accuracy development tool for diffraction limited short-wavelength optics

    Article • January 2000, American Institute of Physics

    Dr. Kenneth A Goldberg

  219. Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy

    Article • Applied Optics, December 1999, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  220. <title>Recent advances in EUV phase-shifting point diffraction interferometry</title>

    Article • November 1999, SPIE

    Dr. Kenneth A Goldberg

  221. Direct comparison of EUV and visible-light interferometries

    Article • June 1999, SPIE

    Dr. Kenneth A Goldberg

  222. EUV scattering and flare of 10X projection cameras

    Article • June 1999, SPIE

    Dr. Kenneth A Goldberg

  223. Sub-100-nm lithographic imaging with an EUV 10X microstepper

    Article • June 1999, SPIE

    Dr. Kenneth A Goldberg

  224. Dual-domain point diffraction interferometer

    Article • Applied Optics, June 1999, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  225. Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions

    Article • IEEE Journal of Quantum Electronics, May 1999, Institute of Electrical & Electronics Engineers (IEEE)

    Dr. Kenneth A Goldberg

  226. Testing extreme ultraviolet optical systems at-wavelengthwith sub-angstrom accuracy

    Article • January 1999, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  227. Extreme ultraviolet interferometric measurements of diffraction-limited optics

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 1999, American Vacuum Society

    Dr. Kenneth A Goldberg

  228. Interferometric at-wavelength flare characterization of extreme ultraviolet optical systems

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 1999, American Vacuum Society

    Dr. Kenneth A Goldberg

  229. Phase effects owing to multilayer coatings in a two-mirror extreme-ultraviolet Schwarzschild objective

    Article • Applied Optics, December 1998, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  230. High-accuracy interferometry of extreme ultraviolet lithographic optical systems

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, November 1998, American Vacuum Society

    Dr. Kenneth A Goldberg

  231. Microassembly technologies for MEMS

    Article • September 1998, SPIE

    Dr. Kenneth A Goldberg

  232. Characterization of the accuracy of EUV phase-shifting point diffraction interferometry

    Article • June 1998, SPIE

    Dr. Kenneth A Goldberg

  233. At-wavelength interferometry of extreme ultraviolet lithographic optics

    Article • January 1998, American Institute of Physics

    Dr. Kenneth A Goldberg

  234. Extreme ultraviolet interferometry

    Article • December 1997, Office of Scientific and Technical Information (OSTI)

    Dr. Kenneth A Goldberg

  235. At-wavelength interferometry for extreme ultraviolet lithography

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, November 1997, American Vacuum Society

    Dr. Kenneth A Goldberg

  236. Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry

    Article • July 1997, SPIE

    Dr. Kenneth A Goldberg

  237. Phase-shifting point-diffraction interferometry at EUV wavelengths

    Article • April 1997, Office of Scientific and Technical Information (OSTI)

    Dr. Kenneth A Goldberg

  238. Phase-shifting point diffraction interferometer

    Article • Optics Letters, October 1996, Optical Society of America (OSA)

    Dr. Kenneth A Goldberg

  239. Interferometry using undulator sources (invited, abstract)

    Article • Review of Scientific Instruments, September 1996, American Institute of Physics

    Dr. Kenneth A Goldberg

  240. Progress towards λ/20 extreme ultraviolet interferometry

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, November 1995, American Vacuum Society

    Dr. Kenneth A Goldberg

  241. At-wavelength testing of optics for EUV

    Article • May 1995, SPIE

    Dr. Kenneth A Goldberg

  242. EUV Optical Testing

    Article • SPIE

    Dr. Kenneth A Goldberg