All Stories

  1. Microscope polarization calibration with nanoslits enables accurate and precise measurements of molecular orientation
  2. Complex cooperativity in DNA origami revealed via design-dependent defectivity
  3. Complex cooperativity in DNA origami revealed via design dependent defectivity
  4. DNA nanostructure decoration: a how-to tutorial
  5. Variable gain DNA nanostructure charge amplifiers for biosensing
  6. Binding, brightness, or noise? Extracting temperature-dependent properties of dye bound to DNA
  7. Temperature-dependent Thermodynamic and Photophysical Properties of SYTO-13 Dye Bound to DNA
  8. Synthesizing the biochemical and semiconductor worlds: the future of nucleic acid nanotechnology
  9. Failure Mechanisms in DNA Self-Assembly: Barriers to Single-Fold Yield
  10. DNA Origami Design: A How-To Tutorial
  11. Revealing thermodynamics of DNA origami folding via affine transformations
  12. So, You Want to Have a Nanofab? Shared-Use Nanofabrication and Characterization Facilities: Cost-of-Ownership, Toolset, Utilization, and Lessons Learned
  13. The Self-Report Delinquency Scale From the National Longitudinal Study of Adolescent to Adult Health Among At-Risk for Delinquency Youths
  14. The Self-Report Delinquency Scale From the National Longitudinal Study of Adolescent to Adult Health Among At-Risk for Delinquency Youths
  15. Nanoscale deformation in polymers revealed by single-molecule super-resolution localization–orientation microscopy
  16. Aligned carbon nanotube morphogenesis predicts physical properties of their polymer nanocomposites
  17. Nanoparticle Manufacturing – Heterogeneity through Processes to Products
  18. Research Update: Electron beam-based metrology after CMOS
  19. J. Alexander Liddle: Metrology at the nanoscale key to understanding of next generation lithography processes
  20. Molecular Precision at Micrometer Length Scales: Hierarchical Assembly of DNA–Protein Nanostructures
  21. Guiding the Self-Assembly of RecA Proteinfilaments on DNA Scaffolds to Create Rationally Designed Nanostructures
  22. Assessing fabrication tolerances for a multilevel 2D binary grating for 3D multifocus microscopy
  23. Nanomanufacturing: A Perspective
  24. Gravitational Sweep Sedimentation Velocity
  25. High-Resolution Imaging and Spectroscopy at High Pressure: A Novel Liquid Cell for the Transmission Electron Microscope
  26. Dielectric Characterization by Microwave Cavity Perturbation Corrected for Nonuniform Fields
  27. High-speed, high-purity separation of gold nanoparticle–DNA origami constructs using centrifugation
  28. Innenrücktitelbild: Quantum-Dot Fluorescence Lifetime Engineering with DNA Origami Constructs (Angew. Chem. 4/2013)
  29. Quantum-Dot Fluorescence Lifetime Engineering with DNA Origami Constructs
  30. Quantum-Dot Fluorescence Lifetime Engineering with DNA Origami Constructs
  31. DNA evolves
  32. Lithography, metrology and nanomanufacturing
  33. The innovator's non‐dilemma: the case of next‐generation lithography
  34. Available in print
  35. Soft X-Ray Microscopy of Nanomagnetism
  36. New Overlay Technique for Fabrication of 15nm Zone Plates
  37. EUV focus sensor: design and modeling
  38. Fabrication of platinum nanoparticles and nanowires by electron beam lithography (EBL) and nanoimprint lithography (NIL): comparison of ethylene hydrogenation kinetics
  39. Nonaqueous development of silsesquioxane electron beam resist
  40. Probe shape measurement in an electron beam lithography system
  41. Euv system optimization and advanced lithography research at Lawrence Berkeley National Laboratory
  42. Resist Requirements and Limitations for Nanoscale Electron-Beam Patterning
  43. Mask-membrane impact on image blur in SCALPEL
  44. Mask blank fabrication, pattern transfer, and mounting distortion simulations for the 8-in. format SCALPEL mask
  45. SCALPEL mask parametric study
  46. Thermomechanical modeling of the SCALPEL mask during exposure
  47. Global space charge effect in SCALPEL
  48. Thermal distortion predictions of a silicon wafer during exposure in a SCALPEL tool
  49. Modeling of laminar e-beam source for SCALPEL
  50. Finite element modeling of SCALPEL masks
  51. Stress mapping techniques for the SCALPEL mask membrane system
  52. Space-charge results from the SCALPEL proof-of-concept system
  53. SCALPEL mask defect imaging analysis
  54. Analytical model of the “Shot Noise” effect in photoresist
  55. Mask membrane distortions due to pattern transfer for electron-beam lithography (SCALPEL) masks
  56. Initial wafer heating analysis for a SCALPEL lithography system
  57. SCALPEL mask-membrane charging
  58. Pattern processing results and characteristics for SCALPEL masks
  59. Optimization of a SCALPEL® exposure tool using a diffractive image quality technique
  60. Equivalent modeling of SCALPEL mask membrane distortions
  61. Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL)
  62. Electron-optics method for high-throughput in a SCALPEL system: Preliminary analysis
  63. Metrology of scattering with angular limitation projection electron lithography masks
  64. Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL)
  65. Electron-beam lithography
  66. Proximity Effect Correction in Projection Electron Beam Lithography (Scattering with Angular Limitation Projection Electron-Beam Lithography)
  67. Error budget analysis of the SCALPEL(R) mask for sub-0.2 μm lithography
  68. Fracture Strength of Thin Ceramic Membranes
  69. High-throughput projection electron-beam lithography employing SCALPEL
  70. Transport in submicrometer buried mesotaxial cobalt silicide wires
  71. Choice of system parameters for projection electron-beam lithography: Accelerating voltage and demagnification factor
  72. Production of x-ray mask blanks for a point source stepper
  73. FABRICATION OF NANOSTRUCTURE ARRAYS USING PROJECTION ELECTRON-BEAM LITHOGRAPHY
  74. Sub-Micron Mesotaxial CoSi2 Wires
  75. Mask fabrication for projection electron-beam lithography incorporating the SCALPEL technique
  76. ALLOY CARBIDE PRECIPITATION IN A HIGH COBALT-NICKEL SECONDARY HARDENING STEEL