All Stories

  1. Epitaxial buffer structures grown on 200 mm engineering substrates for 1200 V E-mode HEMT application
  2. Point defect formation near the epitaxial Ge(001) growth surface and the impact on phosphorus doping activation
  3. Heavily phosphorus doped germanium: Strong interaction of phosphorus with vacancies and impact of tin alloying on doping activation
  4. Evolution of phosphorus-vacancy clusters in epitaxial germanium
  5. New method to release channels for Ge gate-all-around transistors.