Publication not explained

This publication has not yet been explained in plain language by the author(s). However, you can still read the publication.

If you are one of the authors, claim this publication so you can create a plain language summary to help more people find, understand and use it.

Featured Image

Read the Original

This page is a summary of: All-ion-implanted planar-gate current aperture vertical Ga2O3 MOSFETs with Mg-doped blocking layer, Applied Physics Express, May 2018, Japan Society of Applied Physics,
DOI: 10.7567/apex.11.064102.
You can read the full text:

Read

Contributors

The following have contributed to this page