Rapid Epitaxial Growth of Si and SiGe Mono-Crystalline Films on Silicon-on-Glass Substrates by Reactive CVD Using SiH4, GeH4, and F2

Hiroshi Noge, Akira Okada, Ta-Ko Chuang, J. Greg Couillard, Michio Kondo
  • MRS Proceedings, January 2012, Cambridge University Press
  • DOI: 10.1557/opl.2012.867

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http://dx.doi.org/10.1557/opl.2012.867

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