Publication not explained

This publication has not yet been explained in plain language by the author(s). However, you can still read the publication.

If you are one of the authors, claim this publication so you can create a plain language summary to help more people find, understand and use it.

Featured Image

Read the Original

This page is a summary of: Thick SiO[sub 2] Films Obtained by Plasma-Enhanced Chemical Vapor Deposition Using Hexamethyldisilazane, Carbon Dioxide, and Hydrogen, Journal of The Electrochemical Society, January 2000, The Electrochemical Society,
DOI: 10.1149/1.1393589.
You can read the full text:

Read

Contributors

The following have contributed to this page