Using Ellipsoidal Layout Style to Boost the Electrical Performance of the MOSFETs Regarding the 180 nm CMOS ICs Manufacturing Process

  • William Souza Cruz, Jacobus Willibrordus Swart, Salvador Pinillos Gimenez
  • ECS Transactions, April 2018, The Electrochemical Society
  • DOI: 10.1149/08508.0097ecst

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http://dx.doi.org/10.1149/08508.0097ecst

The following have contributed to this page: Dr Salvador Pinillos Gimenez