Fabrication of 10-Nanometer-scale GaAs Dot Structures by In Situ Selective Gas Etching with Self-Assembled InAs Dots as a Mask

  • Go Yusa, Hiroshi Noge, Yutaka Kadoya, Takao Someya, Tadatomo Suga, Pierre Petroff, Hiroyuki Sakaki
  • Japanese Journal of Applied Physics, September 1995, Japan Society of Applied Physics
  • DOI: 10.1143/jjap.34.l1198

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The following have contributed to this page: Professor Hiroshi Noge