Etching of InAs in HCl Gas and Selective Removal of InAs Layer on GaAs in Ultrahigh-Vacuum Processing System

Yutaka Kadoya, Takashi Yoshida, Takao Someya, Hidefumi Akiyama, Hiroshi Noge, Hiroyuki Sakaki
  • Japanese Journal of Applied Physics, October 1993, Japan Society of Applied Physics
  • DOI: 10.1143/jjap.32.l1496

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http://dx.doi.org/10.1143/jjap.32.l1496

The following have contributed to this page: Professor Hiroshi Noge