What is it about?
This paper shows a new method to measure SAQP pitch walking of Fins by using standalone OCD, without any use of hybrid metrology. This paper also details an approach that can be applied, to use CD-SEM as a reference metrology instead of costly TEMs.
Featured Image
Why is it important?
It solves a difficult industry challenge to measure SAQP pitch walking using OCD.
Read the Original
This page is a summary of: Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference, Journal of Micro/Nanolithography MEMS and MOEMS, October 2016, SPIE,
DOI: 10.1117/1.jmm.15.4.044004.
You can read the full text:
Contributors
The following have contributed to this page
