Elastic relaxation in patterned and implanted strained silicon on insulator

S. Baudot, F. Andrieu, F. Rieutord, J. Eymery
  • Journal of Applied Physics, June 2009, American Institute of Physics
  • DOI: 10.1063/1.3137200

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http://dx.doi.org/10.1063/1.3137200

The following have contributed to this page: Dr Joel Eymery