What is it about?
High entropy alloys (HEAs) and high entropy alloy films (HEFs) are gaining increasing attention in the research community since they have superior mechanical properties. CoCrFeMnNi is the most famous HEA, but CoCrFeMnNi HEFs have not yet been reported very much. DC magnetron sputtering with a CoCrFeMnNi equimolar target is used to deposit HEFs on glass substrates, A5052 aluminum sheets, and S45C steel sheets. The resulting HEFs are observed to be embedded as sub-surface bands, less than a micrometer under the substrate surface. This is attributed to injection of the HEF elements into the base materia. Another possibility is that substrate elements migrate to the surface by an Ar plasma.
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Why is it important?
The HEF crystallite size on glass substrates was several nanometers, meaning that high hardness is expected in HEFs produced by DC magnetron sputtering.
Perspectives
Sputtered HEF has many possibilities as a candidate for carbide coating layers. Furthremore, the paper was deeply moving for the author (YM), as it was the result of a master's student's research (DT) at Kanazawa Unbiversity in Japan, and the first co-authored paper with Dr. Lyth, a classmate from his PhD course.
Yoji Miyajima
Kanazawa Daigaku
Read the Original
This page is a summary of: Deposition of high entropy alloy sub-surface films on metal substrates via DC magnetron sputtering with a CoCrFeMnNi target, Applied Physics Letters, April 2024, American Institute of Physics,
DOI: 10.1063/5.0201180.
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