What is it about?

We provide new methods to model realistic plasma discharges efficiently and accurately, which is crucial in semi-conductor industry. We first introduce the numerical scheme that we used, and then benchmark our codes with existing, accurate, but much more expensive models. It is shown that our codes can be more than 10 times faster, while still maintaining reasonable accuracy.

Featured Image

Why is it important?

Despite a lot of fluid models for the capacitively coupled discharges, they do not take into account kinetic effects and thus are not accurate enough for modelling density, current and temperature in the discharges. On the other hand, traditional kinetic models are too expensive to run within acceptable amount of time, especially as the chamber size becomes larger and larger in semi-conductor industry. We propose to use the new methods for modelling capacitively coupled discharges, which are not only accurate but also more than 10 times faster.


This is an excellent paper and is a proud of me.

Haomin Sun
Ecole Polytechnique Federale de Lausanne

Read the Original

This page is a summary of: Direct implicit and explicit energy-conserving particle-in-cell methods for modeling of capacitively coupled plasma devices, Physics of Plasmas, October 2023, American Institute of Physics,
DOI: 10.1063/5.0160853.
You can read the full text:




The following have contributed to this page