What is it about?

A combinatorial lithium-ion thin-film electrolyte deposition process that uses different type arc plasma sources has been developed for thin film inorganic complementary electrochromic devices (ECDs).

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Why is it important?

The fabrication of Li based inorganic solid-state electrolyte is also a bottleneck for mass production due to the lower deposition rate and the lack of ion doping method. And, the effective ion concentration control of the doping method is still needed to be further investigated for the all-solid-state electrochemical devices application.With the coaxial-type pulsed arc plasma doping process, the lithium doping tantalum pentoxide thin films doped with the two different frequencies have been investigated.


Writing this article was a great pleasure as it has co-authors with whom I have had long standing collaborations. This article also lead to a greater improvement in inorganic solid-state electrolyte research.

Min-Chuan Wang
Institute of Nuclear Energy Research

Read the Original

This page is a summary of: A coaxial-type pulsed arc plasma doping process for the lithium-ion thin-film electrolyte application, Applied Physics Letters, August 2020, American Institute of Physics, DOI: 10.1063/5.0017614.
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