What is it about?
The aim of this work is to provide a basic understanding of and a strategy on how to investigate the electron dynamics in capacitively coupled radio frequency discharges at low pressures. The interplay between elementary quantities (densities, fluxes, electric fields and temperatures) is studied and the results (obtained by 1d3v Particle-In-Cell simulations) are illustrated by representative figures and educational animations. Fundamental questions are addressed and state-of-the-art diagnostic methods are used to answer these questions following a step-by-step approach.
Photo by Hal Gatewood on Unsplash
Why is it important?
Such fundamental insights are essential in order to understand and optimize industrial applications such as plasma etching for the semiconductor manufacturing and plasma sputtering for the coating technology.
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This page is a summary of: Electron dynamics in low pressure capacitively coupled radio frequency discharges, Journal of Applied Physics, May 2020, American Institute of Physics, DOI: 10.1063/5.0003114.
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