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This page is a summary of: Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2+ NO → F + FNO at an Elevated Temperature, The Journal of Physical Chemistry C, October 2013, American Chemical Society (ACS),
DOI: 10.1021/jp4084794.
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