Bonding Structures of ZrHx Thin Films by X-ray Spectroscopy
What is it about?
We investigate the local atomic structure and the trend in the chemical bonding in ZrHx thin films produced by reactive magnetron sputtering (rDCMS) as a function of average hydrogen content (x = 0.15, 0.30, and 1.16) as well as bulk α-Zr with X-ray absorption near edge structure (XANES) and extended X-ray absorption fine structure (EXAFS) spectroscopy using synchrotron radiation and supported with X-ray diffraction (XRD) using a lab-source.
Why is it important?
Spectroscopic measurements indicated charge-transfer from Zr to H that may affect the electrical properties as observed by a rather large change of the electronic states close to the Fermi level compared to pure Zr metal.
The following have contributed to this page: Associate Prof. Martin Magnuson