Bonding Structures of ZrHx Thin Films by X-ray Spectroscopy

  • Martin Magnuson, Fredrik Eriksson, Lars Hultman, Hans Högberg
  • The Journal of Physical Chemistry C, November 2017, American Chemical Society (ACS)
  • DOI: 10.1021/acs.jpcc.7b03223

Bonding Structures of ZrHx Thin Films by X-ray Spectroscopy

What is it about?

We investigate the local atomic structure and the trend in the chemical bonding in ZrHx thin films produced by reactive magnetron sputtering (rDCMS) as a function of average hydrogen content (x = 0.15, 0.30, and 1.16) as well as bulk α-Zr with X-ray absorption near edge structure (XANES) and extended X-ray absorption fine structure (EXAFS) spectroscopy using synchrotron radiation and supported with X-ray diffraction (XRD) using a lab-source.

Why is it important?

Spectroscopic measurements indicated charge-transfer from Zr to H that may affect the electrical properties as observed by a rather large change of the electronic states close to the Fermi level compared to pure Zr metal.


Associate Prof. Martin Magnuson
Department of Physics, Chemistry and Biology (IFM)

Metal hydrides, MeHx, is an interesting class of materials, where hydrogen inclusion increases the wear resistance, strength, ductility, and hardness properties of the pure metal.

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The following have contributed to this page: Associate Prof. Martin Magnuson

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