What is it about?

We propose an efficient and low-cost synthesis of a Fe(II) complex, to be used in the Chemical Vapor Deposition (CVD) of nanostructured Fe2O3 thin films. The compound is monomeric, has a octahedral structure, and possesses a remarkable air stability and a high volatility at moderate temperatures.

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Why is it important?

Good precursors (molecular sources) for nanostructures by chemical-vapor-deposition should have sufficient volatility, a high thermal stability and a clean decomposition pathway. No such precursors were available for the deposition of iron oxide materials. In this work, a Fe(II) precursor possessing just those amenable features was synthesized and successfully tested in the CVD growth of iron oxide nanostructures.


Chemical vapor deposition (CVD) is a widely-used approach for the preparation of novel materials. Iron oxide materials are becoming increasingly relevant for diverse technology fields. Our Fe(II) complex was indeed a very successful precursor for growing iron oxide nanostructure, as demonstrated by several follow-up studies by different research groups. Various Fe2O3-based materials, with applications in gas sensing and H2-production have already been realized starting from our precursor, and many other could follow, driven by the increasing interest toward iron oxide materials.

Gloria Tabacchi
university of insubria

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This page is a summary of: An iron(II) diamine diketonate molecular complex: Synthesis, characterization and application in the CVD of Fe2O3 thin films, Inorganica Chimica Acta, January 2012, Elsevier,
DOI: 10.1016/j.ica.2011.10.036.
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