What is it about?
The main issue is quantitation in secondary ion mass spectrometry (SIMS). This paper shows how to separate sputtering process from the process of ionisation. What we do? We collect sputtered material during the process of ion erosion on to the rotating substrate, with sub monolayer deposition and then we analyse the collected deposit with the SIMS technique.
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Why is it important?
Since „matrix effects” are very strong in SIMS analysis, quantitative procedures are very important.
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This page is a summary of: Storing matter technique performed in the analytical chamber of a quadrupole SIMS analyser, Surface and Interface Analysis, September 2014, Wiley,
DOI: 10.1002/sia.5670.
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