Redox Reactions at Cu,Ag/Ta2O5Interfaces and the Effects of Ta2O5Film Density on the Forming Process in Atomic Switch Structures

  • Tohru Tsuruoka, Ilia Valov, Stefan Tappertzhofen, Jan van den Hurk, Tsuyoshi Hasegawa, Rainer Waser, Masakazu Aono
  • Advanced Functional Materials, June 2015, Wiley
  • DOI: 10.1002/adfm.201500853

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http://dx.doi.org/10.1002/adfm.201500853

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