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  1. A systematic and quantitative analysis of the bulk and interfacial properties of the AlSiO dielectric on N-polar GaN using capacitance–voltage methods
  2. An improved methodology for extracting interface state density at Si3N4/GaN
  3. Electrical properties and interface abruptness of AlSiO gate dielectric grown on 000 1 ¯ N-polar and (0001) Ga-polar GaN
  4. Net negative fixed interface charge for Si3N4 and SiO2 grown in situ on 000-1 N-polar GaN