All Stories

  1. Stoichiometry of the ALD-Al2O3/4H–SiC interface by synchrotron-based XPS
  2. 4H-SiC/Al2O3 interface using Synchrotron XPS
  3. Dual band nano structured anti reflection thin film coatings
  4. Enhancement of Curie Temperature (T c) and Magnetization of Fe-Ni Invar alloy Through Cu Substitution and with He+2 Ion Irradiation
  5. Structural, optical, and electrical characteristics of AlN:Ho thin films irradiated with 700keV protons
  6. Ion implantation induced nitrogen defects in GaN
  7. 4H-silicon carbide-dielectric interface recombination analysis using free carrier absorption
  8. Copper phthalocyanine and metal free phthalocyanine bulk heterojunction photodetector
  9. Structural characteristics of Ni+-implanted AlN thin film
  10. Passivation of SiC device surfaces by aluminum oxide
  11. Device design assessment of 4H–SiC n-IGBT – A simulation study
  12. Substitutional carbon doping of hexagonal multi-walled boron nitride nanotubes (h-MWBNNTs) via ion implantation
  13. Structural modifications of AlInN/GaN thin films by neon ion implantation
  14. HfO2/Al2O3 Bilayered High-k Dielectric for Passivation and Gate Insulator in 4H-SiC Devices
  15. Effect for hydrogen, nitrogen, phosphorous, and argon ions irradiation on ZnO NWs
  16. A Comparison of Free Carrier Absorption and Capacitance Voltage Methods for Interface Trap Measurements
  17. Position-Dependent Bulk Traps and Carrier Compensation in 4H-SiC Bipolar Junction Transistors
  18. Impact of Ionizing Radiation on the $\hbox{SiO}_{2}/ \hbox{SiC}$ Interface in 4H-SiC BJTs
  19. Effect of Nuclear Scattering Damage at SiO2/SiC and Al2O3/SiC Interfaces – a Radiation Hardness Study of Dielectrics
  20. Radiation-Hard Dielectrics for 4H–SiC: A Comparison Between $\hbox{SiO}_{2}$ and $ \hbox{Al}_{2}\hbox{O}_{3}$
  21. Surface Recombination Investigation in Thin 4H-SiC Layers
  22. Characterization of Al-Based High-k Stacked Dielectric Layers Deposited on 4H-SiC by Atomic Layer Deposition
  23. Toward the Understanding of Stacked Al-Based High-k Dielectrics for Passivation of 4H-SiC Devices
  24. Effect of 3.0 MeV helium implantation on electrical characteristics of 4H-SiC BJTs
  25. Low-Temperature Annealing of Radiation-Induced Degradation in 4H-SiC Bipolar Junction Transistors
  26. Annealing of ion implanted 4H–SiC in the temperature range of 100–800°C analysed by ion beam techniques
  27. Time-resolved luminescence studies of proton-implanted GaN
  28. Electrical and structural characterization of ion implanted GaN