Effect of amino ligand size of Si precursors on initial reaction with an –OH-terminated Si(001) surface for atomic layer deposition

  • Ji-Su Kim, Jin-Hoon Yang, Yong-Chan Jeong, Dae-Hee Kim, Seung-Bin Baek, Yeong-Cheol Kim
  • Japanese Journal of Applied Physics, July 2014, Japan Society of Applied Physics
  • DOI: 10.7567/jjap.53.08ne04

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http://dx.doi.org/10.7567/jjap.53.08ne04