Characterization of Al-Based High-k Stacked Dielectric Layers Deposited on 4H-SiC by Atomic Layer Deposition

  • M. Usman, T. Pilvi, Markku Leskelä, Adolf Schöner, Anders Hallén
  • Materials Science Forum, March 2011, Trans Tech Publications
  • DOI: 10.4028/www.scientific.net/msf.679-680.441

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http://dx.doi.org/10.4028/www.scientific.net/msf.679-680.441

The following have contributed to this page: Dr. Muhammad Usman