Characterization of Al-Based High-k Stacked Dielectric Layers Deposited on 4H-SiC by Atomic Layer Deposition

  • M. Usman, T. Pilvi, Markku Leskelä, Adolf Schöner, Anders Hallén
  • Materials Science Forum, March 2011, Trans Tech Publications
  • DOI: 10.4028/

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The following have contributed to this page: Dr. Muhammad Usman