Microroughness at the Si/SiO2 Interface from Pre-Oxidation Annealing, Measured Using Quantum Oscillations in Fowler-Nordheim Tunneling Currents

  • J. C. Poler, K. K. McKay, E. A. Irene
  • MRS Proceedings, January 1992, Cambridge University Press
  • DOI: 10.1557/proc-280-139

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http://dx.doi.org/10.1557/proc-280-139

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