What is it about?
The processing parameters of the DC magnetron sputtering technique such as negative substrate bias voltage as well as substrate heating have a major role on microstructure evolution and their relation with the mechanical properties of the as-deposited Ni-Zr films.
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Why is it important?
DC magnetron sputtering is a non-equilibrium process of thin film deposition technique, where we can synthesize the thin films with desirable microstructure as well as properties. Substrate heating increases the surface roughness due to grain coarsening, which affects the scratch resistance, but increases the mechanical strength like indentation hardness, Young's modulus. However, by applying Negative substrate bias voltage, it is possible to reduce the grain size, which improves indentation hardness, Young's modulus as well as scratch resistance and decreases the surface roughness.
Perspectives
This study creates interest in materials scientists, those are working in the field of mechanical properties of thin film and nanocrystalline materials and their relation with the microstructure evolution.
Mr BIBHU PRASAD SAHU
Indian Institute of Technology Kharagpur
Read the Original
This page is a summary of: Effect of annealing and process parameters on microstructure and properties of DC Magnetron Sputtered Ni-Zr alloy thin films, MRS Advances, January 2017, Cambridge University Press,
DOI: 10.1557/adv.2017.122.
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