The Effect of Channel-Protect Oxide on Laser Recrystallized Silicon-on-insulator MOS devices.

S. Sritharan, G. J. Collins, J. Fukumoto, N. Szluk, K. M. Jones, M. M. Al-Jassim
  • MRS Proceedings, January 1986, Cambridge University Press
  • DOI: 10.1557/proc-74-621
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http://dx.doi.org/10.1557/proc-74-621

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