Engineered Low Resistivity Titanium-Tantalum Nitride Films by Atomic Layer Deposition

  • Ana R. Londergan, Jereld L. Winkler, Kim Vu, Lawrence Matthysse, Thomas E. Seidel, Ofer Sneh
  • MRS Proceedings, January 2001, Cambridge University Press
  • DOI: 10.1557/proc-714-l5.3.1

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http://dx.doi.org/10.1557/proc-714-l5.3.1